ISSN:
0021-8995
Keywords:
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
In this article, a polyimide precursor was synthesized from oxydianiline and a diacid chloride. This diacid chloride was prepared by the reaction of thionyl chloride with a diacid, which resulted from the reaction of pyromellitic dianhydride with cinnamyl alcohol in N-methylpyrrolidone (NMP). The photoresist, made from the above polyimide precursor, was spincoated onto silicon wafers, prebaked, and then exposed to UV light with a high pressure Hg lamp. The pattern generation process was also investigated. The appropriate conditions of the photolithographic procedures, involving photoresist compounding, spin coating, prebaking, exposure, development, rinse, postbaking, etc., were determined. The experimental results show that the photoresist exhibited excellent thermal stability and adequate photosensitivity.
Additional Material:
5 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/app.1992.070440807
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