ISSN:
1013-9826
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Optical emission spectra from plasma during deposition of diamond film were investigatedby an optic multi-channel spectrometer using a CCD array sensor. The diamond film was deposited byDC plasma enhanced (PE) chemical vapor deposition (CVD) using hydrogen and methane gasmixture, where substrate was located at near the plasma and the discharge was performed byintermittent discharge. When Pg during the deposition was increased from 50 to 250 Torr, the opticalemissions of hydrogen (Hα and Hβ) and C2 were increased, and corresponding to these increases,deposition rate of the diamond film was increased and crystalline quality became superior. When Cmwas changed from 1 to 3 %, the emission from C2 was increased, and whereas, the emission fromhydrogen was decreased. Corresponding to these changes of the emission, the deposition rate of thefilm was increased and amorphous component in the deposited film was also increased. These resultsshow that the increase of C2 results in the increase of the deposition rate, and increase of hydrogen iseffective to eliminate amorphous component, and therefore, monitoring of the optical emission fromhydrogen and C2 is useful for the deposition process of the diamond film
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/01/52/transtech_doi~10.4028%252Fwww.scientific.net%252FKEM.321-323.1691.pdf
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