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  • 1
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: A general expression for the energy and angular distribution of Auger/photoelectrons emitted from a specimen with an arbitrary depth profile is presented. The central quantities in this expression are the so-called partial escape distributions, which describe the probability that a signal electron generated in a certain depth interval escapes from the surface with a direction in a certain angular interval after experiencing a certain number of inelastic scattering processes. The partial escape distributions accounting for elastic scattering are calculated in the transport approximation. Comparison of analytical calculations with Monte Carlo data based on the more relastic Mott crosssection for elastic scattering yields excellent agreement. As an illustration of the general approach, the energy/angular spectrum of a sample with a model depth profile has been evaluated using analytical calculations and Monte Carlo data. The results obtained show that the proposed formalism properly accounts for elastic and inelastic processes and correctly predicts the shape of the energy distribution in the vicinity of the peak. It is, moreover, shown that the true intrinsic spectrum and depth profile may be reconstructed simultaneously from the measured energy/angular distribution of emitted electrons.
    Additional Material: 6 Ill.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 23 (1995), S. 823-832 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Different methods of calculating efficiently the angular distribution of photoelectrons escaping from uniform amorphous and polycrystalline targets are analysed in detail. Comparison has been made between the analytical results and Monte Carlo simulation data. The analytical approach is based on the solution of the kinetic equation in the transport approximation. The Monte Carlo codes comprise the conventional forward simulation algorithm and the reverse trajectory method. The reverse trajectory method employs the reciprocity theorem and allows same statistically significant results to be obtained with less computational effort. The angular distributions of photoelectrons leaving Al, Si, Cu, Ag, Ta and Au samples have been calculated as a function of polar and azimuthal angles for electron energies relevant in quantitative XPS analysis. It has been found that both Monte Carlo methods provide equivalent results. The discrepancies between the transport approximation and the Monte Carlo data do not exceed, as a rule, 5%. The largest deviations of the analytical results from those found by Monte Carlo codes are observed in the vicinity of the emission directions, where the photoelectric differential cross-section has its minima, and are about 15%. The agreement between the results obtained by different approaches, corresponding to the magic angle geometry, is within 2% for all cases studied.
    Additional Material: 7 Ill.
    Type of Medium: Electronic Resource
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