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  • 1
    Electronic Resource
    Electronic Resource
    Efficient, compact power supply for repetitively pulsed, "triggerless" cathodic arcs (1999)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 70 (1999), S. 4532-4535 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A power supply for "triggerless," repetitively pulsed cathodic arcs has been developed. It is based on a thyristor-switched, high-voltage, high-current, pulse-forming network (PFN). It can provide high pulsed currents (up to 2 kA), with duration of 600 μs, and pulse repetition rate of up to 10 Hz. Higher repetition rates are possible at lower current. The rectangular pulse shape and amplitude are reproducible to within a few percent. Cathodic arc initiation is extremely reliable because the charging voltage is much higher than the minimum starting voltage for the triggerless arc initiation method. The energy utilization efficiency is very high by intentionally mismatching load and PFN impedances and by using an efficiency-enhancing diode; the stored energy is dissipated primarily in the arc.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1150106
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  • 2
    Electronic Resource
    Electronic Resource
    Plasma distribution of cathodic arc deposition systems (1996)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 6785-6790 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The plasma distribution using a cathodic arc plasma source with and without magnetic macroparticle filter has been determined by depositing on a transparent plastic substrate and measuring the film absorption. It was found that the width of the distribution depends on the arc current, and it also depends on the cathode material which leads to a spatial separation of the elements when an alloy cathode is used. By applying a magnetic multicusp field near the exit of the magnetic filter, it was possible to modify the plasma distribution and obtain a flat plasma profile with a constant and homogeneous elemental distribution which was demonstrated by depositing FeNd thin films. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.361523
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  • 3
    Electronic Resource
    Electronic Resource
    High ion charge states in a high-current, short-pulse, vacuum arc ion source : Proceedings of the 6th international conference on ion sources (1996)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 67 (1996), S. 1202-1204 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Ions of the cathode material are formed at vacuum arc cathode spots and extracted by a grid system. The ion charge states (typically 1–4) depend on the cathode material and only a little on the discharge current as long as the current is low. Here we report on experiments with short pulses (several μs) and high currents (several kA); this regime of operation is thus approaching a more vacuum sparklike regime. Mean ion charge states of up to 6.2 for tungsten and 3.7 for titanium have been measured, with the corresponding maximum charge states of up to 8+ and 6+, respectively. The results are discussed in terms of Saha calculations and freezing of the charge state distribution. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1146731
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  • 4
    Electronic Resource
    Electronic Resource
    Low energy vacuum arc ion source : Proceedings of the 5th international conference on ion sources (1994)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 1260-1261 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: We have developed a version of vacuum arc ion source that produces a metal ion beam with energy of order 1 keV. The ion beam extractor is a three-grid, multiaperture configuration with a low accel–decel ratio so that ions are extracted from the plasma at a relatively high energy and then decelerated to the desired net beam energy. We have tentatively given this ion source the name leva, for low energy vacuum arc ion source. The leva source is cylindrical in shape with diameter about 6 cm and length about 16 cm and is located completely within the vacuum system; it is constructed from metal and alumina only and can be baked. We have operated it at net extraction voltages in the range 0.5–10 kV and produced a titanium ion beam current of up to 120 mA. Here we describe the source construction details and its performance.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1145239
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  • 5
    Electronic Resource
    Electronic Resource
    Broad-beam multi-ampere metal ion source : International conference on ion sources (1990)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 61 (1990), S. 577-579 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: An embodiment of the MEVVA (metal vapor vacuum arc) high current metal ion source has been developed in which the beam is formed from a 10-cm-diam set of extractor grids and which produces a peak beam current of up to several amperes. The source, MEVVA V, operates in a pulsed mode with a pulsewidth, at present, of 0.25 ms and a repetition rate of up to several tens of pulses per second (power supply limited). The multi-cathode feature that was developed for the prior source version, MEVVA IV, has been incorporated here also; one can switch among any of 18 separate cathodes and thus metallic beam species. Maximum beam extraction voltage is over 90 kV, and since the ion charge states are typically from Q=1 to 5, depending on the metal employed, the ion energy in the extracted beam can thus be up to several hundred keV. This source is a new addition to the MEVVA family of metal ion sources, and we are at present investigating the operational regimes and the limits to the source performance. In this article we describe the source, and present some preliminary results.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1141922
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  • 6
    Electronic Resource
    Electronic Resource
    Vacuum arc ion source with filtered plasma for macroparticle-free implantation : Proceedings of the 5th international conference on ion sources (1994)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 1319-1321 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: An inherent feature of the vacuum arc discharge is that small droplets of micrometer size (macroparticles) are produced along with the plasma in the cathode spots. Droplet contamination of the substrate can occur when implanting metal ions using a vacuum arc ion source. The contamination can be significant for some cathode materials such as lead and other low melting point metals, which for some ion implantation applications such as for semiconductor doping and metallic corrosion inhibition can be a detriment. We have developed a vacuum arc ion source in which the plasma is filtered before the ions are extracted. By guiding the arc-produced plasma through a 60° bent magnetic duct, macroparticles are completely removed from the plasma. No additional power supply for the guiding magnetic field is required since the pulsed arc current itself is used to drive the magnetic solenoid. Tests have shown that macroparticle-free metal ion implantation can be done while maintaining the high ion beam current typical of vacuum arc ion sources.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1144997
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  • 7
    Electronic Resource
    Electronic Resource
    Charge state distribution studies of the metal vapor vacuum arc ion source : International conference on ion sources (1990)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 61 (1990), S. 583-585 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: We have studied the charge state distribution of the ion beam produced by the MEVVA (metal vapor vacuum arc) high current metal ion source. Beams produced from a wide range of cathode materials have been examined and the charge state distributions have been measured as a function of many operational parameters. In this article we review the charge state data we have accumulated, with particular emphasis on the time history of the distribution throughout the arc current pulse duration. We find that, in general, the spectra remain quite constant throughout most of the beam pulse, as long as the arc current is constant. There is an interesting early-time transient behavior when the arc is first initiated and the arc current is still rising, during which time the ion charge states produced are observed to be significantly higher than during the steady current region that follows.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1141968
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  • 8
    Electronic Resource
    Electronic Resource
    A filamentless ion source for materials processing : Proceedings of the 7th international conference on ion sources (1998)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 69 (1998), S. 880-882 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A dual-stage, multiaperture gas ion source with 5 cm beam diameter has been built and characterized. The first discharge stage is a constricted glow discharge injecting a plasma stream into a discharge cavity supporting a Penning ion gauge discharge in the low pressure mode. Both discharge stages and ion extraction are fed by a single, grounded power supply. This simplifies the electrical setup and reduces costs. Various gases have been tested including nitrogen, oxygen, and argon. The ion beam current density is 250 μA/cm2, i.e., the beam current is about 5 mA, at an extraction voltage of 3.0 kV and a discharge current of 59 mA. Measurements of the ion beam current as a function of various parameters such as the discharge voltage and current, gas flow, and magnetic field are presented. The source is compact and can be easily adapted to various materials modification applications in which ion energies of a few keV are required. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1148470
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  • 9
    Electronic Resource
    Electronic Resource
    Some novel design features of the LBL metal vapor vacuum arc ion sources : International conference on ion sources (1990)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 61 (1990), S. 580-582 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: The family of MEVVA (metal vapor vacuum arc) high current metal ion sources developed at LBL over the past several years has grown to include a number of different source versions with a wide range of some of the design and operational parameters. The MicroMEVVA source is a particularly compact version, about 2 cm diam and 10 cm long, while the MEVVA IV weighs some 30 kG. MEVVAs IV and V incorporate multiple cathode assemblies (16 and 18 separate cathodes, respectively), and the operating cathode can be switched rapidly and without downtime. The new MEVVA V embodiment is quite compact considering its broad beam (10 cm), high voltage (100 kV), and multiple cathode features. The large-area extractor grids used in MEVVA V were fabricated using a particularly simple technique, and they are clamped into position and can thus be changed simply and quickly. The electrical system used to drive the arc is particularly simple and incorporates several attractive features. In this article we review and describe a number of the mechanical and electrical design features that have been developed for these sources.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1141924
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  • 10
    Electronic Resource
    Electronic Resource
    Effect of resonant microwave power on a Penning ionization gauge ion source (1985)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 56 (1985), S. 1894-1896 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Microwave power resonant to the local electron cyclotron frequency has been coupled into the plasma discharge chamber of a hot-cathode PIG (Philips or Penning Ionization Gauge) ion source. The extracted ion beam was monitored for changes in characteristics of the beam with and without application of the microwave power. No change was seen in the ion charge state distribution. A small but significant reduction in the beam noise level was seen, and this technique may thus find application in situations where beam quiescence is important.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1138440
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