ISSN:
0360-6376
Keywords:
Physics
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
Notes:
Metals may be chemically incorporated into organic lithographic resists that contain or can be functionalized with —OH groups. A wide range of metal incorporation (0.04-12% of total solids by weight) has been demonstrated for AZ-1370 (Shipley), a diazo-type photo- and electron resist. The novolac component of the resist is reacted with an organometallic halide, RyMX (R = alkyl, aryl; M = transition or main group metal; X = CI, Br; 1 ≤ y ≤ 4, depending on M) to introduce the corresponding organometallic function into the resist.
Additional Material:
2 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/pol.1983.170210526
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