ISSN:
1573-4803
Source:
Springer Online Journal Archives 1860-2000
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Abstract Fluorine-doped tin dioxide (SnO2∶F) films were deposited from a tin tetrachloride solution in methanol utilizing a pyrosol deposition process. It is shown from thermodynamic calculations that the atmosphere during deposition is oxygen-rich and also suggested that chlorine and hydrogen chloride, which are produced during the deposition reaction, influence crystal growth. Detailed electrical, optical and structural properties of the material with respect to varying film thickness and substrate temperature are presented and discussed. Resistivity of the films deposited at 450 °C decreased from 6×10−4 to 2×10−4 Ωcm, while the mobility increased from 14 to 45 cm2V−1s−1, respectively, when the film thickness was varied from 100 to 1650 nm. The carrier concentration was relatively unchanged for film thicknesses higher than 200 nm. Optimized SnO2∶F films (∼600 nm) having a resistivity of ∼6×10−4 Ωcm, a carrier mobility of ∼20 cm2V−1s−1, a carrier concentration of ∼8×1020 cm−3 and a transmittance in excess of 80% are quite suitable as electrodes for amorphous silicon solar cells.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF00352131
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