Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
62 (1987), S. 3461-3463
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We report a new grating fabrication technique for optical devices in the InP/InGaAsP system. Conventional, but very shallow, holographically defined wet etching is used to pattern ultrathin masking layers grown by chemical beam epitaxy. This is followed by selective and anisotropic wet etching, which is shown to yield exceptionally deep, narrow-pitch gratings with reproducible profiles and dimensions.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.339319
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