ISSN:
1573-4803
Source:
Springer Online Journal Archives 1860-2000
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Abstract Photolithography to produce TiO2 patterns from amorphous films of (η5-C5H5)2Ti(N3)2 has been demonstrated. The efficiency of the reaction has been measured yielding a quantum yield of 0.025. The mechanism of the photoreactions of (η5-C5H5)2Ti(N3)2 has been studied using Fourier transform-infrared spectroscopy in both a low-temperature 1,2-epoxyethylbenzene glass and as surface films. In each case the primary photochemical process was found to be loss of a single azido group. The result of subsequent photolysis was found to be dependent upon medium and temperature. In the low-temperature glass no further photochemistry was observed. The exhaustive photolysis of films at 20 K, or room temperature, under a vacuum or in air led to loss of all ligands and the formation of TiO2.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF00365013
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