ISSN:
0032-3888
Keywords:
Chemistry
;
Chemical Engineering
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
A methodology for determining the optimal single component developer/rinse pair for a negative acting resist is described. This method is applicable to any resist basing its negative action on crosslinking and development in organic based solvents. Within the method, initial developer/rinse candidates are identified by utilizing the Hansen 3-dimensional solubility parameter model. This model provides a thermodynamic solubility picture of the resist, and determines those developers which will only minimally contribute towards swelling of defined features. Developer/rinse pairs are subsequently evaluated for acceptable resist dissolution kinetics, and compatibility with existing spray development processes. The optimum developer/rinse pair will only minimally effect changes in temperature which result in a minimum sensitivity to relative humidity variations. The use of this method is illustrated by choosing an optimal developer/rinse system for a chlorine containing, styrene based negative acting resist. The overall electron beam lithographic performance of this resist is shown to be improved with respect to a previously used 2-component ketone based developer.
Additional Material:
9 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/pen.760261617
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