Crystallography Journals Online : IUCR Backfile Archive 1948-2001
Chemistry and Pharmacology
Absolute measurements of the 200 reflection in Si and Ge at various azimuthal orientations are compared with N-beam calculations of the integrated intensity. All of the non-zero integrated intensity is accounted for by multiple-beam scattering. The measurements match the calculations on the assumption that F200 = 0.
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