AIP Digital Archive
Electrical Engineering, Measurement and Control Technology
This paper describes a new type of electron beam evaporation intense beam current broad beam metal ion source. In this ion source, a focusing electron beam is used to bombard and vaporize the metal and other solid elements within the same chamber where the metal and solid element atoms are ionized by arc discharge. It can operate with gaseous and solid elements. Both pure or mixed ions with single or multiple charge states can also be extracted from this source. The performance and the characteristics of this source have tested. Ion beams of a series of elements, which include C, W, Ta, Mo, Cr, Ti, B, Cu, Ni, AI, Ar, N, etc., have been extracted, and the highest beam current is up to 90 mA. By using this ion beam bombardment, a good mixture between substrate and film was observed. Deposition rates as high as 25 A(ring)/s for Mo, 30 A(ring)/s for Ti, and 80 A(ring)/s for C have been obtained. The structure of the ion source and the experimental results will be presented in this paper. © 1996 American Institute of Physics.
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