ISSN:
1572-9540
Source:
Springer Online Journal Archives 1860-2000
Topics:
Physics
Notes:
Abstract We have studied by transverse field positive muon spectroscopy μ+SR, the muon diffusion in V3Si. We found that the muon is static and localized at tetrahedral interstitial sites below 200 K. Above 200 K the muons diffuse with an activiation energy 2550 (220) K. The nature of this diffusion process is discussed.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF02401545
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