ISSN:
1572-8986
Keywords:
Laser-induced fluorescence
;
optical emission
;
plasma etching
;
RF discharge
;
CCl4
;
actinometry
Source:
Springer Online Journal Archives 1860-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Technology
Notes:
Abstract We describe the use of laser-induced fluorescence and optical emission spectroscopy to study the chemistry of CCl4 discharges. Spatially and spectrally resolved plasma-induced emission from six different species—CCl, C, Cl, Cl+, N2, and N 2 + —were contrasted with the CCl free radical concentration profile, determined from spatially resolved laser-induced fluorescence, to arrive at a simple model for the CCl4 discharge chemistry. Electrons appear to be produced at the electrode surfaces by secondary emission resulting from high-energy ion impact. As the electrons are accelerated across the sheath, they are rapidly attenuated by resonant dissociative attachment to CCl4 and its plasma-generated products. This mode of decomposition produces bright emission nearest to the electrode surfaces and is conducive to the formation of “glow polymer.” To test the validity of using N2 as an actinometer in determining the CCl radical concentration, we compared laser-induced fluorescence measurements of the CCl concentration with plasma-induced CCl emission normalized to N2 emission.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF00566020
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