Polymer and Materials Science
Wiley InterScience Backfile Collection 1832-2000
Chemistry and Pharmacology
A novel material, bis(trimethylsilylmethoxy resorcinol) was synthesized by a phenoxide alkylation method. The new substituted resorcinol was then terpolymerized with 2-methyl resorcinol and formaldehyde. We evaluated the preparation of this new polymer in terms of feed ratio of the reactants, reaction time, and temperature; and prepared a series of materials with different silicon content. Polymers which retained base solubility at high silicon content were blended with a dissolution inhibitor, and studied for their lithographic capabilities as positive, photo- or electron-beam bilevel resists. When used in a photoresist formulation a dose of 120 mJ/cm2 allowed formation of submicron features. When used in an electron-beam resist formulation 0.5 μm line/space patterns were obtained at a dose of 10 μC/cm2. Furthermore, these materials displayed etching ratios relative to hardbaked HPR206 of ≃ 1 : 10. This value is believed to be large enough to allow these resists to withstand reactive ion etching conditions for pattern transfer in a bilevel scheme.
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