ISSN:
1572-9486
Source:
Springer Online Journal Archives 1860-2000
Topics:
Physics
Notes:
Abstract Thin a-C:N films were prepared by pulsed laser ablation using a KrF excimer laser and a graphite target. The influence of the substrate temperatureT s (27°C and 330°C), and the nitrogen gas ambient pressurep n (1.5 Pa, 13.3 Pa and 40 Pa) on the film properties was studied. The films were characterized by scanning electron microscopy, Rutherford backscattering, spectroscopic ellipsometry and by Raman scattering. The nitrogen content in the films was in the range from 20 to 31 at.%, and those of oxygen from 5.6 to 10.7 at.%. For lowerp n andT s the film delamination was observed.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF01742456
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