Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Review of Scientific Instruments
58 (1987), S. 1-5
ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
A long lifetime ion source with plasma cathode has been developed for use in ion implantation. In this ion source, a plasma of a nonreactive working gas serves as a cathode in place of a thermionic tungsten filament used in the Freeman ion source. In an applied magnetic field, the plasma is convergent, i.e., filamentlike; in zero magnetic field, it turns divergent and spraylike. In the latter case, the plasma exhibits a remarkable ability when the working gas has an ionization potential larger than the feed gas. By any combination of a working gas of either argon or neon and a feed gas of AsF5 or PF5, the lifetime of this ion source was found to be more than 90 h with an extraction voltage of 40 kV and the corresponding ion current density 20 mA/cm2. Mass spectrometry results show that this ion source has an ability of generating a considerable amount of As+ and P+ ions from AsF5 and PF5, and hence will be useful for realizing a fully cryopumped ion implanter system. This ion source is also eminently suitable for use in oxygen ion production.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1139559
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