ISSN:
1662-9752
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
The spatial phase locked scanning electron beam lithography systems (SPLEBL) is anew lithography technique with a pattern placement precision of about 1 nm. The SPLEBLtechnique can solve the major problem of poor placement accuracy existed in the conventionalscanning electron beam lithography for that it uses a Fourier technique to detect the beam positionin real time during exposure. The fiducial grid plays a key role in SPLEBL. The two-dimensionalglobal fiducial grid with a grid period of 250 nm placed on top of the e-beam resist used in SPLEBLwith high contrast, high brightness, long-range spatial-phase coherence, large area and a patternplacement precision of about 1 nm is fabricated using optical interference lithography in this article.The detail fabrication process is described and the SEM images of the fabricated grid are alsopresented in this paper. Only one evaporation step and several spin-coating steps are required in thefabrication process, so it is simple and user friendly
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/02/18/transtech_doi~10.4028%252Fwww.scientific.net%252FMSF.575-578.1252.pdf
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