ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
An electron cyclotron resonance plasma with large diameter, uniform, and high electron density is produced using a multislot antenna. The uniformity of the plasma is within 5% over 20 cm in diameter. The electron density of the helium plasma in front of a substrate is 7×1010 cm−3, while the electron density without the substrate is higher than the cutoff density for 2.45 GHz. The effect of the magnetic field configuration on plasma uniformity is investigated. Both of the R wave (electron cyclotron wave) and L wave are found to be excited in the plasma. © 1995 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1146063
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