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  • 1
    Publication Date: 2011-08-19
    Description: A number of samples of optical thin film materials were flown on Shuttle flight STS-8 as part of an experiment to evaluate their interaction with residual atomic oxygen in low earth orbit. Osmium was selected because of its usefulness as a reflective optical coating for far-UV instruments and for confirmation of results from previous Shuttle flights in which such coatings disappeared. Reflectance data and photographic evidence are presented to support the hypothesis that the osmium disappearance is due to reaction with oxygen to form a volatile oxide. Platinum and iridium, which were included for comparison, fared much better.
    Keywords: OPTICS
    Type: Applied Optics (ISSN 0003-6935); 24; 2660-266
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  • 2
    Publication Date: 2011-08-16
    Description: It is shown that a simple metal-dielectric-metal filter for broadband ultraviolet (BUV) reflectance control can provide a stable and effective means for reducing stray visible radiation in UV reflective optical systems. The application of such a filter in a BUV instrument resulted in a reduction of scattered visible light by at least an order of magnitude. The instrument has been in orbit for 2.5 year without loss of sensitivity or an increase in scattered light background.-
    Keywords: PHYSICS, GENERAL
    Type: Applied Optics; 12; June 197
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  • 3
    Publication Date: 2011-08-16
    Description: The problem of detector response, which arises in the application of the reflectance vs angle of incidence method to the determination of optical constants in the vacuum UV spectral region is discussed. The analysis is performed for the side-viewing 1P21 detector sensitized with sodium salycilate. To take advantage of the wide selection photomultipliers available in the end-on configuration, a scheme for converting the end-on types to a side viewing geometry with a response uniform over several degrees of detector rotation is developed. It consists of a 32-mm diam spherical collector, located at the end of a cylindrical photomultiplier holder, with 12-mm entrance and viewing ports and a position for the sensitized screen also 12-mm in diameter.-
    Keywords: INSTRUMENTATION AND PHOTOGRAPHY
    Type: Applied Optics; 11; Dec. 197
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  • 4
    Publication Date: 2011-08-17
    Description: Thin transparent films of In2O3 or In2O3 + SnO2 prepared by evaporation or sputtering have been tested for use as surface layers for spacecraft temperature control coatings. The films are intended to prevent nonuniform electric charge buildup on the spacecraft exterior. Film thicknesses of 300 to 500 A were found to be optimal in terms of durability and minimum impact on the solar absorptance and the thermal emissivity of the underlayers. As a verification of their suitability for long-duration space missions, the films were subjected to simulated solar UV plus proton irradiation in a vacuum.
    Keywords: SPACECRAFT DESIGN, TESTING AND PERFORMANCE
    Type: Applied Optics; 18; May 15
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  • 5
    Publication Date: 2011-08-24
    Description: Advances in optical coating and materials technology are one of the key motivators for the development of missions such as the Far Ultraviolet Spectroscopic Explorer recently selected by NASA for an Explorer class mission in the mid 1990's. The performance of a range of candidate coatings are reviewed for normal-incidence and glancing-incidence applications, and attention is given to strengths and problem areas for their use in space. The importance of recent developments in multilayer films, chemical-vapor deposited SiC (CVD-SiC) mirrors, and SiC films are discussed in the context of EUV instrumentation design. For example, the choice of optical coatings is a design driver for the selection of the average glancing angle for the FUSE telescope, and impacts efficiency, short-wavelength cut-off, and physical size.
    Keywords: OPTICS
    Type: Advances in Space Research (ISSN 0273-1177); 11; 11, 1
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  • 6
    Publication Date: 2019-06-27
    Description: Reticles designed with quartz bases are masked with desired pattern and then are coated with highly adherent layers of chromium, chromium silver alloy, silver, copper, and black chromium (mixture of chromium and chromium oxides). Black chromium final layer produces required nonreflective surface.
    Keywords: PHYSICAL SCIENCES
    Type: GSC-11188
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  • 7
    facet.materialart.
    Unknown
    In:  CASI
    Publication Date: 2019-06-27
    Description: The present application is directed towards a process for producing high resolution, substantially non-reflective reticles or choppers suitable for use for transmitting in both the visible and near ultra-violet regions, able to withstand reasonable handling and extreme environmental conditions, and capable of operating at speeds of from 2800 to about 9000 revolutions per minute without distortion. In particular, the present invention is directed towards the production or reticles having a quartz base vacuum coated with chromium, chromium-silver alloy, and silver with electrodeposited copper and black chromium thereon, respectively, in the form of a reticle pattern. The quartz permits the transmission of light while the pattern is opaque to light. The reticles of the present invention are intended for use in optical trackers, such as star trackers used in outer space.
    Keywords: GENERAL
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  • 8
    facet.materialart.
    Unknown
    In:  CASI
    Publication Date: 2019-06-27
    Description: A method for the production of reticles, particularly those for use in outer space, where the product is a quartz base coated with highly adherent layers of chromium, chromium-silver, and silver vacuum deposited through a mask, and then coated with an electrodeposit of copper from a copper sulfate solution followed by an electrodeposit of black chromium is described. The masks are produced by coating a beryllium-copper alloy substrate with a positive working photoresist, developing the photoresist, according to a pattern to leave a positive mask, plating uncoated areas with gold, removing the photoresist, coating the substrate with a negative working photoresist, developing the negative working photoresist to expose the base metal of the pattern, and chemically etching the unplated side of the pattern to produce the mask.
    Keywords: INSTRUMENTATION AND PHOTOGRAPHY
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  • 9
    Publication Date: 2019-06-27
    Description: Design and performance of evaporator for vacuum ultraviolet mirror coatings by aluminum compound films
    Keywords: MATERIALS, NONMETALLIC
    Type: NASA-TM-X-63750 , X-283-69-492
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