ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
A multicusp magnetic field plasma-surface ion source, normally used for H−ion-beam formation, has been modified for the generation of high-intensity, pulsed, heavy-negative-ion beams suitable for a variety of uses. A brief description of the source and basic pulsed-mode operational data (e.g., intensity versus cesium oven temperature, sputter probe voltage, and discharge pressure) are given. In addition, illustrative examples of intensity versus time and the mass distributions of ion beams extracted from a number of samples, along with emittance data, are also presented. Preliminary results obtained during dc operation of the source under low-discharge-power conditions suggest that sources of this type may alo be used to produce high-intensity (mA) dc beams.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1141298
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