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  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Journal of materials science 5 (1986), S. 743-746 
    ISSN: 1573-4811
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 12 (1988), S. 211-217 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Anomalous compound surface layer growth is observed during plasma nitriding of ferrous materials under certain operating conditions. The formation of an iron oxy-nitride layer by the redeposition of sputtered cathode material was found to influence the growth kinetics of the γ'-Fe4N layer which forms during plasma nitriding of α-Fe to the extent where the γ'-Fe4N surface layer initially increases and subsequently decreases in thickness after deposition of the iron oxy-nitride layer. The nature of these layers was studied by XPS and reflection EELS to elucidate the electron structure of the valence bands of these compunds. Results are Results are presented which explain the thermodynamic stability of the iron oxy-nitride layer and the apparent de-nitriding effect that this layer formation has on the underlying γ'-Fe4N layer.
    Additional Material: 8 Ill.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 18 (1992), S. 491-495 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Low-energy (0.65-3 keV) Ar+ ions were used to sputter (100) and (110) GaAs. Preferential sputtering effects were investigated by means of Auger electron spectroscopy. The results show that the equilibrium sputtered surface composition on both surfaces is depleted in As. No sample orientation effects were observed. However, the equilibrium compositions of the sputtered surfaces become increasingly Ga-enriched by increasing the energy of the bombarding ions. The sputtered surface composition is independent of the angle of incidence of the bombarding Ar+ ions. For the different experimental conditions, the mean final surface compositions varied from GaAs0.89 to GaAs0.69. These values are in broad agreement with other reported AES studies. This agreement is probably due to the fact that the sputtered surface composition is independent of the angle of incidence of the ions on the GaAs sample.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
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