Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Review of Scientific Instruments
65 (1994), S. 3126-3133
ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
A brief review is presented of the "Raduga'' 1–4 repetitively pulsed metal vapor vacuum arc ion sources. Their operation principles and functional ranges are described. The Raduga ion sources provide single- and multi-element implantation. These advantages are achieved by using not only pure single-element or mixed ion fluxes, but also pulsed beam sequences with controllable composition and energy of each ion species. Another feature of the ion sources is their ability to generate a sequence of ion beam and plasma stream pulses. Switching between ion irradiation and plasma deposition can be done from pulse to pulse, within each pulse, or after accumulation of a required dose. Some specific features of the emission properties of broad beam metal vapor vacuum arc ion sources are described.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1144766
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