Electronic Resource
Amsterdam
:
Elsevier
Microelectronic Engineering
2 (1984), S. 219-226
ISSN:
0167-9317
Keywords:
Optimization
;
aberrations
;
electrostatic lenses
;
focusing
;
ion optics
;
ion-beam lithography
;
particle optics
Source:
Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
Topics:
Electrical Engineering, Measurement and Control Technology
Type of Medium:
Electronic Resource
URL:
http://linkinghub.elsevier.com/retrieve/pii/0167-9317(84)90002-9
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