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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 88 (2000), S. 1380-1388 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Thin tungsten nitride (WNx) films were produced by reactive dc magnetron sputtering of tungsten in an Ar–N2 gas mixture. The effects of the variation of nitrogen partial pressure on the composition, residual stress, and structural properties of these films as well as the influence of postdeposition annealing have been studied. The films were analyzed in situ by a cantilever beam technique, and ex situ by x-ray photoelectron spectroscopy, electron energy-loss spectroscopy, x-ray diffraction, and transmission electron microscopy (TEM). It was found that at N concentrations below 8 at. %, the films (typical 150 nm in thickness) were essentially bcc α-W. An amorphous phase was observed in the range of about 12–28 at. % N. When N concentrations reached ∼32 at. % or above, a single-phase structure of W2N was formed. Annealing of the as-deposited films resulted in crystallization of the amorphous or an improved crystallinity of the W2N structure, which was related to the N concentration. Stresses of all W and WNx films were compressive. As the N concentration was increased, the stress decreased and reached its lowest value for amorphous samples near 20 at. % N. Past this point, the compression of films rose again. These results can be ascribed to structural changes induced by the pressure-dependent variation in the average energy of particles bombarding the film during deposition. Cross-sectional TEM studies showed that all crystalline WNx films had columnar microstructures. The average column width near stoichiometry of W2N was ∼20±5 nm near the film surface. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 87 (2000), S. 177-187 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The residual stress and structural properties of tungsten thin films prepared by magnetron sputtering as a function of sputtering-gas pressure are reported. The films were analyzed in situ by a cantilever beam technique, and ex situ by x-ray diffraction, cross-sectional transmission electron microscopy (TEM), x-ray photoelectron spectroscopy, electron energy-loss spectrometry, and energy-filtered electron diffraction. It is found that the residual stress, microstructure, and surface morphology are clearly correlated. The film stresses, determined in real time during the film formation, depend strongly on the argon pressure and change from highly compressive to highly tensile in a relatively narrow pressure range of 12–26 mTorr. For pressures exceeding ∼60 mTorr, the stress in the film is nearly zero. It is also found that the nonequilibrium A15 W structure is responsible for the observed tensile stress, whereas the stable bcc W or a mixture of bcc W and A15 W are in compression. Cross-sectional TEM evidence indicates that the compressively stressed films contain a dense microstructure without any columns, while the films having tensile stress have a very columnar microstructure. High sputtering-gas pressure conditions yield dendritic-like film growth, resulting in complete relaxation of the residual tensile stresses. Structural details of the A15 W and amorphous W phases were also investigated at the atomic level using energy-filtered electron diffraction with reduced radial distribution function G(r) analysis. By comparing the experimental and simulated G(r) distributions, the A15 W structure is determined to be composed of ordered and stacking faulted W3W structures and the amorphous W has a disordered structure of W3O. The effect of oxygen in stabilizing the A15 phase found is explained on the basis of structural and thermodynamic stability. © 2000 American Institute of Physics.
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 75 (1999), S. 2211-2213 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A combination of energy-filtered electron diffraction, electron energy-loss spectroscopy, transmission electron microscopy, and x-ray diffraction are used to establish that oxygen impurities incorporated in tungsten films prepared by magnetron sputtering in the early stage of the deposition play a dominant role in the formation of an amorphous phase. Energy-filtered electron diffraction data collected from a range of amorphous films were Fourier transformed to a reduced density function (RDF) and matched with an amorphous model. The results show that better agreement with the experimental RDF is achieved if the amorphous model consists of a random continuous matrix of clusters with W3O-like symmetry. © 1999 American Institute of Physics.
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  • 4
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Physics Letters A 137 (1989), S. 96-98 
    ISSN: 0375-9601
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Physics
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Physics Letters A 142 (1989), S. 341-343 
    ISSN: 0375-9601
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Physics
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Chinese Astronomy and Astrophysics 9 (1985), S. 76-79 
    ISSN: 0275-1062
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Physics
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    Springer
    Journal of materials science 19 (2000), S. 1941-1943 
    ISSN: 1573-4811
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 18 (1992), S. 729-739 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: The surface composition, structure and initial stages of oxygen adsorption of Ni3Al(110) have been investigated by ISS. The surface composition of the Ni3Al(110) surface was determined by Li+ and He+ ion scattering using selected scattering geometries. These results consistently show a surface composition of 50% Ni-50% Al in the outermost layer with some small percentage of Ni enhancement (perhaps 1-2%), while the second layer is basically Ni. The surface structure has been probed by measuring the intensity of Li+ ion scattering as a function of incident angle along the [001], [112], [111], [332] and [110] azimuthal directions. The interpretation of experimental data is based on the calibrated shadow cone and chain model simulations. The results show that there is no displacement of first-layer Al relative to first-layer Ni, but there is a contraction in the first-to-second layer spacing of 0.11 ± 0.08 Å. The adsorption of oxygen at low exposure (∼8L) and pressures in the range 2 × 10-8-1 × 10-6 mbar at a temperature of 700°C shows the disappearance of the Ni ISS signal, and the results suggest the formation of a monolayer of an AlOx overlayer. Using a model similar to that previously studied for the formation of AlOx islands on the Ni3Al(001) surface, this oxide overlayer has been shown to be AlOx islands with no influence on remaining areas on the crystal. The mechanism for apparent interchange of the Al atoms to the surface to replace the Ni atoms is also discussed.
    Additional Material: 10 Ill.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 17 (1991), S. 903-910 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: The interaction of O with the Ni3Al(001) surface has been studied using low-energy He+ scattering. Oxygen adsorption at an exposure of 10 L and a temperature of 700°C results in the total disappearance of the Ni ISS signal, indicating the formation of a monolayer AlOx overlayer. This oxide AlOx overlayer has been examined by measuring the azimuthal angle dependence of the scattered ion yield at fixed scattering angle under different coverages of oxygen. The azimuthal variations of the Ni and Al ISS signals from the O-covered surface are compared with those of Ni and Al from the clean surface, and the results used to derive a value for the fractional coverage of oxygen on the surface. The analysis supports the model that the oxide initially grows in the form of islands, with no influence on remaining areas of the crystal. No evidence of the ordering of the oxide islands was observed. Further evidence of the growth of the AlOx surface. The results indicate that the remaining (uncovered) Ni3Al surface retains the crystal structure of a clean surface. The rate of growth of the AlOx islands on the Ni/3Al(001) surface was also found to be related to temperature.
    Additional Material: 10 Ill.
    Type of Medium: Electronic Resource
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  • 10
    Publication Date: 2011-09-26
    Print ISSN: 0003-6951
    Electronic ISSN: 1077-3118
    Topics: Physics
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