Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
66 (1989), S. 965-968
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
A new photolithographic process for the patterning of WO3 is reported. A layer of sputtered polycrystalline WO3 can be patterned by a combination of photolithographic and dry etching processes to selectively cover a fraction of eight Pt microelectrodes each ∼50 μm long, 2 μm wide, and 0.3 μm thick, and spaced 1.2 μm apart. The modified microelectrode arrays were characterized by electrochemistry, surface profilometry, and scanning electron microscopy. A pair of microelectrodes connected by WO3 comprises a microelectrochemical transistor with pH-dependent electrical characteristics based on the pH and potential dependent conductivity of WO3 associated with the reversible electrochemical reaction WO3+nH++ne−(arrow-right-and-left)HnWO3.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.343474
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