Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
75 (1999), S. 1314-1316
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We describe a resistless proximal probe-based lithography technique, which enables the direct patterning of complex and submicron-sized structures of various materials. The method is based on a combination of scanning probe microscopy and the shadow masking technique, whereby structures are locally deposited through pinhole-like apertures situated in the proximity of a cantilever tip. Predefined excursions of the sample lead to the direct fabrication of arbitrary structures on the surface. Complex patterns such as rings and intersecting lines with linewidths well below 0.1 μm are presented. © 1999 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.124679
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