Publication Date:
2018-12-05
Description:
Author(s): J. Scheers, A. Ryabtsev, A. Borschevsky, J. C. Berengut, K. Haris, R. Schupp, D. Kurilovich, F. Torretti, A. Bayerle, E. Eliav, W. Ubachs, O. O. Versolato, and R. Hoekstra Laser-produced Sn plasma sources are used to generate extreme ultraviolet light in state-of-the-art nanolithography. An ultraviolet and optical spectrum is measured from a droplet-based laser-produced Sn plasma, with a spectrograph covering the range 200–800 nm. This spectrum contains hundreds of sp... [Phys. Rev. A 98, 062503] Published Tue Dec 04, 2018
Keywords:
Atomic and molecular structure and dynamics
;
high-precision measurements
Print ISSN:
1050-2947
Electronic ISSN:
1094-1622
Topics:
Physics
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