ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Reactive dc magnetron sputtering of W was performed in a plasma of Ar+O2 with and without CF4 addition and substrate bias. Structural studies by atomic force microscopy, X-ray diffraction, infrared reflectance spectroscopy, and Raman spectroscopy indicated that the electron e bombardment associated with a positive substrate bias led to grain growth and partial crystallization while maintaining a high density of W=O double bonds presumably on internal surfaces. Electrochemical measurements showed that the durability under extended Li+ intercalation/ deintercalation was excellent for e-bombarded oxide films and poor for oxyfluoride films. Spectrophotometric studies of the electrochromism yielded that the color/bleach dynamics was slow for the e-bombarded oxide but fast for the oxyfluoride. The range of optical modulation was large. Tandem films, with a thin protective layer of e-bombarded oxide covering a thicker oxyfluoride layer, were able to combine rapid dynamics with good durability. © 1995 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.360169
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