ALBERT

All Library Books, journals and Electronic Records Telegrafenberg

X
feed icon rss

Your email was sent successfully. Check your inbox.

An error occurred while sending the email. Please try again.

Proceed reservation?

Export
  • 1
    Electronic Resource
    Electronic Resource
    Growth mode of epitaxial Si0.5Ge0.5 layer grown on Si(100) by ion-beam-assisted deposition (1995)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 5993-5999 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The nucleation and growth of the Si0.5Ge0.5 alloy layer on Si (100) substrate during ion-beam-assisted deposition (IBAD) have been investigated by atomic force microscopy, reflection high-energy electron diffraction, transmission electron microscopy, and double-crystal rocking diffraction. We confirmed that Si0.5Ge0.5 nucleates on Si (100) via the Stranski–Krastanov (SK) mechanism by IBAD, and Ar-ion bombardment suppressed SK growth mode as well as improved crystalline perfection. The epitaxial temperature was observed at 200 °C, and it was much lower than the growth temperature (550–600 °C) in molecular-beam epitaxy (MBE). The χmin value (the ratio of channeling to random backscattering yields) was 10.5% lower than the obtained MBE value. The effect of ion bombardment on nucleation was explained as the result of ion-bombardment-induced dissociation of three-dimensional islands and enhanced surface diffusion, and appeared only at low deposition temperatures where the dissociation of three-dimensional islands is more favorable than the formation of those islands. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.360605
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
    Paper (German National Licenses)
    Fulltext
  • 2
    Electronic Resource
    Electronic Resource
    Prediction of solid-state amorphizing reaction using effective driving force (1995)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 983-987 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: It is proposed that the nucleation and growth of the amorphous phase through the solid-state amorphizing reaction in thin-film diffusion couples can be predicted by using the concept of effective driving force. The effective driving force consists of two factors: (i) the thermodynamic driving force given by maximum free-energy difference between the physical mixture of binary elements and the amorphous phase (ΔGmax), and (ii) the kinetic factor given by a ratio of the effective radius of the interstitial site in the host matrix to the atomic radius of the diffusing species (Rm/d). From the comparison of reported experimental results, it is shown that the criterion of effective driving force holds well for predicting the nucleation of the amorphous phase in metal/silicon systems as well as that of metal/metal systems. In addition, the concept of effective driving force holds well for predicting the growth tendency of the amorphous phase in metal/silicon systems. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.360292
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
    Paper (German National Licenses)
    Fulltext
  • 3
    Electronic Resource
    Electronic Resource
    Experimental characterization of the dynamic failure behavior of mortar under impact loading (2001)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 89 (2001), S. 2115-2123 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The failure behavior of mortar under dynamic impact loading is characterized through a series of plate impact experiments. The analysis focuses on the spall strength and the shear stress carrying capacity in different regions of the specimen under normal impact loading. Special attention is paid to the possible existence of a failure wave phenomenon that has been widely recognized as an important failure mechanism for glasses during plate impact. The experiments are designed to allow the strengths of the medium at locations behind and ahead of a possible failure wave front to be analyzed. The diagnostics used include velocity interferometer system for any reflector (VISAR) recording of the free surface velocities of targets and monitoring of the internal stresses via polyvinylidene fluoride (PVDF) gauges embedded in the specimen. Experiments conducted do not provide evidence for the existence of a failure wave phenomenon for mortar under plate normal impact loading. While the study suggests that a threshold impact stress must be exceeded for failure to occur, a clearly defined failure wave that propagates behind the loading wave is not observed. Instead, a gradual failure process that initiates upon the arrival of the loading wave and progresses thereafter is observed. This gradual failure process in mortar is in contrast to the well-defined failure front and complete loss of tensile strength associated with the failure wave phenomenon reported for glasses. The study also indicates that, under impact involving high levels of input stresses, attenuation of the loading wave occurs as it propagates through the failed medium. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1340005
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
    Paper (German National Licenses)
    Fulltext
  • 4
    Electronic Resource
    Electronic Resource
    Nanometer scale lithography at high scanning speeds with the atomic force microscope using spin on glass (1995)
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 67 (1995), S. 2415-2417 
    Details
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have identified a resist material that is suitable for high-speed, nanometer-scale scanning probe lithography (SPL) using the atomic force microscope (AFM). The material is siloxene, commonly known as spin on glass (SOG). The SOG film is deposited on a silicon sample and exposed with a voltage applied between the AFM tip (negative) and the silicon substrate (positive). Voltages of 70 V and currents of 1 nA are typical. It is a positive resist where the etch selectivity between the exposed and unexposed areas is greater than 20. We have recorded line widths as narrow as 40 nm. The writing speed is greater than 1 mm/s, which we believe to be an important attribute in future systems for SPL. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.114565
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
    Paper (German National Licenses)
    Fulltext
  • 5
    Electronic Resource
    Electronic Resource
    Tribological Properties of Ti3SiC2 (2005)
    Oxford, UK : Blackwell Science Inc
    Journal of the American Ceramic Society 88 (2005), S. 0 
    Details
    ISSN: 1551-2916
    Source: Blackwell Publishing Journal Backfiles 1879-2005
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: The present contribution reports the unlubricated friction and wear properties of Ti3SiC2 against steel. The fretting experiments were performed under varying load (1–10 N) and the detailed wear mechanism is studied using SEM-EDS, Raman spectroscopy, and atomic force microscopy. Under the selected fretting conditions, Ti3SiC2/steel tribocouple exhibits a transition in friction as well as wear behavior with coefficient of friction varying between 0.5 and 0.6 and wear rate in the order of 10−5 mm3·(N·m)−1. Raman analysis reveals that the fretting wear is accompanied by the triboxidation with the formation of TiO2, SiO2, and Fe2O3. A plausible explanation for the transition in friction and wear with load is proposed.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1111/j.1551-2916.2005.00569.x
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
    Paper (German National Licenses)
    Fulltext
  • 6
    Electronic Resource
    Electronic Resource
    BMP IMPACTS ON WATERSHED RUNOFF, SEDIMENT, AND NUTRIENT YIELDS (1994)
    Oxford, UK : Blackwell Publishing Ltd
    Journal of the American Water Resources Association 30 (1994), S. 0 
    Details
    ISSN: 1752-1688
    Source: Blackwell Publishing Journal Backfiles 1879-2005
    Topics: Architecture, Civil Engineering, Surveying , Geography
    Notes: : To quantify the effectiveness of best management practice (BMP) implementation on runoff, sediment, and nutrient yields from a watershed, the Nomini Creek watershed and water quality monitoring project was initiated in 1985, in Westmoreland County, Virginia. The changes in nonpoint source (NPS) loadings resulting from BMPs were evaluated by comparing selected parameters from data series obtained before, during, and after periods of BMP implementation. The results indicated that the watershed-averaged curve number, sediment, and nutrient (N and P) concentrations were reduced by approximately 5, 20, and 40 percent, respectively, due to BMP implementation. The nutrient yield model developed by Frere et al. (1980) was applied to the water quality parameters from 175 storms, but it failed to adequately describe the observed phenomena. Seasonal changes in nutrient availability factors were not consistent with field conditions, nor were they significantly different in the pm- and post-BMP periods. An extended period of monitoring, with intensive BMP implementation over a larger portion of the watershed, is required to identify BMP effectiveness.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1111/j.1752-1688.1994.tb03349.x
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
    Paper (German National Licenses)
    Fulltext
  • 7
    Electronic Resource
    Electronic Resource
    A Capillary GC Determination of Cyclopropenoid Fatty Acids in Cottonseed Oils (1988)
    Oxford, UK : Blackwell Publishing Ltd
    Journal of food science 53 (1988), S. 0 
    Details
    ISSN: 1750-3841
    Source: Blackwell Publishing Journal Backfiles 1879-2005
    Topics: Agriculture, Forestry, Horticulture, Fishery, Domestic Science, Nutrition , Process Engineering, Biotechnology, Nutrition Technology
    Notes: A capillary gas chromatography (GC) method was studied for direct analysis for cyclopropenoid fatty acids (CPEFAs) as methyl esters. No thermal alterations were indicated in CPEFA methyl esters on a Supelcowax 10 or a DB-5 capillary column like other fatty acid methyl esters (FAMES), which obviated a second derivatization. GC conditions are described for a complete separation and quantitation of CPEFAs in cottonseed oils. CPEFAs of cottonseed oils from various refining steps were analyzed by the method. The reliability of the method was demonstrated with over 95% recoveries of CPEFA methyl esters diluted in corn oil FAMES at various levels as low as 0.017%.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1111/j.1365-2621.1988.tb09308.x
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
    Paper (German National Licenses)
    Fulltext
  • 8
    Electronic Resource
    Electronic Resource
    Regulation of ATP-citrate lyase at transcriptional and post-transcriptional levels in rat liver
    Amsterdam : Elsevier
    Biochemical and Biophysical Research Communications 189 (1992), S. 264-271 
    Details
    ISSN: 0006-291X
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Biology , Chemistry and Pharmacology , Physics
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1016/0006-291X(92)91553-3
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
    Paper (German National Licenses)
    Fulltext
  • 9
    Electronic Resource
    Electronic Resource
    9-Phenacyl- and 9-(p-methylphenacyl)-3-phenylbenzimidazo[2,1-b]thiazole bromides (1979)
    Copenhagen : International Union of Crystallography (IUCr)
    Acta crystallographica 35 (1979), S. 96-100 
    Details
    ISSN: 1600-5740
    Source: Crystallography Journals Online : IUCR Backfile Archive 1948-2001
    Topics: Chemistry and Pharmacology , Geosciences , Physics
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1107/S0567740879002624
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
    Paper (German National Licenses)
    Fulltext
  • 10
    Electronic Resource
    Electronic Resource
    The effect of particle size of alumina dispersions on the oxidation resistance of Ni-Cr alloys (1997)
    Springer
    Oxidation of metals 48 (1997), S. 391-415 
    Details
    ISSN: 1573-4889
    Keywords: high-temperature oxidation ; Ni-Cr alloy ; oxidation rate ; protective Cr2O3 layer ; Al2O3 dispersion ; selective oxidation
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Abstract The oxidation behavior of Ni-Cr alloys with various chromium concentrations and particle sizes of a dispersion of 10 vol.% Al2O3 was observed in 1 atm of oxygen at 1000°C. This study was intended to determine the critical chromium concentration to form a protective Cr2O3 oxide layer for different Al2O3 particle sizes. The oxidation rate of Ni-Cr alloys containing 10 vol.% Al2O3 followed a parabolic rate law and a Cr2O3 protective layer continuously formed when the oxidation rate decreased rapidly. Times to form a continuous and protective Cr2O3 layer during the initial oxidation shortened as the size of the dispersion decreased. The critical chromium concentration to form a protective Cr2O3 layer in the oxide scale was 6∼9 wt.% and was related strongly to the particle size of the Al2O3 dispersion.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF02153458
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
    Paper (German National Licenses)
    Fulltext
Close ⊗
This website uses cookies and the analysis tool Matomo. More information can be found here...