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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 89 (2001), S. 7983-7987 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Gold Schottky contacts to n-AlGaN were fabricated, and the influence of the semiconductor surface preparation on the electrical performance of the diodes was examined. More significantly, the electrical characteristics of the diodes were found to be sensitive to the environment in which they were exposed. Diodes stored in vacuum had stable but poor electrical characteristics, exhibiting the same high reverse leakage currents, low barrier heights, and high ideality factors as the freshly prepared diodes. On the other hand, didoes exposed to air changed over the course of days, in some cases with decreases in the reverse leakage currents by four or more orders of magnitude and increases in the barrier height by 0.3–0.5 eV. Further study of this change in electrical properties showed that the effect was reversible with exposure to N2 gas or vacuum and adequate temperature. In addition, the effect was more pronounced when the metal contact was thin, indicating that diffusion of gases through the metal was significant. This study suggests that nitride semiconductor devices with Schottky barriers to n-AlGaN as components may exhibit improved performance if they are initially stored in air for a few days prior to encapsulation and will also exhibit a pronounced sensitivity to their storage and operational environment if not adequately protected from it. © 2001 American Institute of Physics.
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 88 (2000), S. 2593-2600 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Electrodeposited, dc magnetron sputtered, and electron beam evaporated Pt contacts to n-GaN (n=1.5×1017 cm−3) are reported. All contacts were rectifying in the as-deposited condition, and values of the barrier height were determined by current–voltage (I–V) and capacitance–voltage (C–V) measurements. The influence of deposition conditions on the electrical characteristics of the sputtered and electrodeposited Pt contacts was further studied. Additionally, a dependence of the barrier height with time following deposition is shown. Taking into consideration all parameters of this study, the barrier height could differ by as much as 0.65 eV by I–V measurements and 0.64 eV by C–V measurements, with I–V and C–V barriers as high as 1.43 and 1.57 eV, respectively. Reverse current densities are reported for a −5 V bias with the highest and lowest median values differing by a factor of 104 as a result of the different deposition conditions. The electrical properties are believed to be strongly influenced by the presence of electrically active defects introduced during metal deposition. Deep level transient spectroscopy data support this hypothesis. © 2000 American Institute of Physics.
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 70 (1997), S. 2156-2158 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The oxidation of single crystal gallium nitride in dry air has been investigated. X-ray photoelectron spectroscopy (XPS) revealed minimal oxide growth at 450 and 750 °C for up to 25 h. However, at 900 °C the growth of an oxide approximately 5000 Å thick was observed after 25 h. This oxide was determined to be the monoclinic β-Ga2O3 using glancing angle x-ray diffraction. XPS spectra of the Ga 3d and Ga 2p core levels indicated peak shifts of 1.2 and 1.3 eV, respectively, from Ga–O to Ga–N bonding. The Ga L3M45M45 core level binding energy was also investigated and β-Ga2O3 and GaN each presented a characteristic peak shape. © 1997 American Institute of Physics.
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 82 (1997), S. 650-654 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Thin Ni films on GaN were annealed at temperatures between 400 and 900 °C in N2, Ar, and forming gas and were analyzed using glancing angle x-ray diffraction and Auger depth profiling. The first indication of an interfacial reaction was found after an anneal at 600 °C for 1 h, after which Ga was observed to be dissolved in the face-centered cubic Ni film. The extent of dissolution increased with continued annealing. After annealing at 750 °C for 1 hr in either N2 or Ar, greater intermixing occurred. The reaction product was either Ni3Ga or face-centered cubic Ni with dissolved Ga. Annealing at 900 °C resulted in the formation of the B2 phase NiGa. It was clear from Auger depth profiles that the reacted film contained significantly more Ga than N and that N2 gas was released to the annealing environment, even when the samples were annealed in N2 gas at 1 atm. Thus, a trend of increasing Ga content in the reacted films was observed with increasing temperature. The observed reactions are consistent with the thermodynamics of the Ni–Ga–N system. © 1997 American Institute of Physics.
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 91 (2002), S. 3711-3716 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: In recent years, Au/Ni/p-GaN ohmic contacts annealed in air have been studied extensively because they provide low specific contact resistances and high transparency. In this article we focus on the environmental and thermal degradation that we have observed in these contacts. When the contacts were not protected from the environment, degradation of the contacts always occurred over a period of days, and after sitting 30 days in the laboratory at room temperature, the current–voltage characteristics of the originally ohmic contacts were nonlinear and the contacts were significantly more resistive. To pinpoint the degradation mechanism, samples were stored at room temperature in dry nitrogen, dry oxygen, dry air, air saturated with water vapor, nitrogen gas saturated with water vapor, or vacuum. These experiments revealed that water vapor was the cause of the room temperature degradation. Since no change in the sheet resistance of the p-type GaN was observed upon aging, four point probe measurements and x-ray photoelectron spectroscopy depth profiles were carried out to determine the interaction between water vapor and the p-type NiO present in the annealed contact metallization. The measurements indicated that hydroxyl groups were incorporated in the NiO, leading to a reduction in its conductivity and presumably a decrease in its hole concentration. Aging studies at 200 °C further revealed poor thermal stability of the contacts not only in water vapor but also in nitrogen gas and vacuum, and this degradation was again linked to a degradation in the conductivity of the NiO component of the contact metallization. © 2002 American Institute of Physics.
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  • 6
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 63 (1993), S. 1255-1257 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Phase formation in the Pd/GaP system is examined by transmission electron microscopy, Auger depth profiling, and x-ray diffraction of Pd films on (100) GaP, and by x-ray diffraction of bulk phase equilibria samples. The reaction of Pd films with GaP is initiated with the formation of an oriented hexagonal ternary phase, Pd2(GaxP1−x). Another hexagonal ternary phase, Pd12( GaxP1−x)7, forms in the intermediate stages of the reaction, and PdGa and PdP2 are found to be in thermodynamic equilibrium with GaP. The Pd/GaP system is very similar to Pd/GaAs.
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  • 7
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 73 (1998), S. 1242-1244 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The barrier heights of Re Schottky contacts to n-GaN were investigated by current–voltage (I–V) and capacitance–voltage (C–V) measurements. Both techniques indicate that the barrier height increases upon annealing at 500 °C for 10 min. After this anneal, a barrier height of 0.82 eV and ideality factor of 1.1 are obtained by I–V measurements performed at 150 °C. The C–V measurements performed at room temperature reveal a barrier height of 1.06 eV. These barrier heights are stable upon further short term annealing at temperatures as high as 700 °C. The Re Schottky contacts were also stable upon prolonged annealing for 24 h at 300 °C. The Re/n-GaN Schottky diode was chosen for study because of its anticipated thermodynamic stability against metallurgical reactions. © 1998 American Institute of Physics.
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  • 8
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 74 (1999), S. 2093-2093 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 73 (1998), S. 3402-3404 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Electrodeposited Pt and sputtered Ni/Pt contacts to p-GaN (p=4.6×1017 cm−3) are reported and compared to sputtered Ni, Pt, and Ni/Au contacts and electron beam and thermally evaporated Ni contacts. Sequential rapid thermal annealing was employed with samples receiving an initial five minute heat treatment of 400 °C followed by 1 min anneals at 500, 600, and 700 °C, all under flowing N2. Plots of current versus voltage for all contacts showed nonlinearity through the origin as deposited and for all annealing conditions. Extracted values of specific contact resistance are thus determined using the measured resistance for a given value of applied current. The lowest contact resistivity was reproducibly provided by the electrodeposited Pt contacts. After a 1 min anneal at 600 °C, a contact resistivity of 1.50×10−2 Ω cm 2 was obtained using the circular transmission line method at a measurement current of 10 mA. Sputtered Ni/Pt contacts provided a contact resistivity of 1.81×10−2 Ω cm2 at 10 mA after a 1 min anneal at 600 °C, while all other metallizations yielded contact resistivities from 3–4×10−2 Ω cm 2. Possible reasons for the lower contact resistivity of the electrodeposited contacts are discussed. © 1998 American Institute of Physics.
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 76 (2000), S. 2271-2273 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The presence of oxygen in the annealing environment can exhibit a strong influence on the activation of p-GaN, as demonstrated by experiments described in this letter. We activated p-GaN at 600–900 °C in four environments: ultrahigh purity (UHP) N2 gettered to remove residual O2, UHP N2 without gettering, 99.5% UHP N2/0.5% UHP O2, and 90% UHP N2/10% UHP O2. The resistivity of the p-GaN was lowest when O2 was intentionally introduced during activation and was highest when extra care was taken to getter residual O2 from the annealing gas. The experiments also demonstrate that unintentionally incorporated O2 can be at high enough levels to influence the activation process. © 2000 American Institute of Physics.
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