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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 87 (2000), S. 3137-3142 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A series of samples was deposited by very high frequency glow discharge in a plasma of silane diluted in hydrogen in concentrations SiH4/(SiH4+H2) varying from 100% to 1.25%. For silane concentrations below 8.4%, a phase transition between amorphous and microcrystalline silicon occurs. Microcrystalline silicon has been characterized by transmission electron microscopy (TEM) and x-ray diffraction. The medium-resolution TEM observations show that below the transition, the microstructure of microcrystalline silicon varies in a complex way, showing a large variety of different growth structures. For the sample close to the phase transition, one observes elongated nanocrystals of silicon embedded in an amorphous matrix followed at intermediate dilution by dendritic growth, and, finally, at very high dilution level, one observes columnar growth. X-ray diffraction data evidence a (220) crystallographic texture; the comparison of the grain sizes as evaluated from TEM observations and those determined using Scherrer's equation illustrates the known limitations of the latter method for grain size determination in complex microstructures. © 2000 American Institute of Physics.
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  • 2
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Journal of the American Chemical Society 66 (1944), S. 914-918 
    ISSN: 1520-5126
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 4971-4975 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Hydrogen incorporation in silicon layers prepared by plasma-enhanced chemical-vapor deposition using silane dilution by hydrogen has been studied by infrared spectroscopy (IR) and elastic recoil detection analysis (ERDA). The large range of silane dilution investigated can be divided into an amorphous and a microcrystalline zone. These two zones are separated by a narrow transition zone at a dilution level of 7.5%; here, the structure of the material cannot be clearly identified. The films in/near the amorphous/microcrystalline transition zone show a considerably enhanced hydrogen incorporation. Moreover, comparison of IR and ERDA and film stress measurements suggests that these layers contain a substantial amount of molecular hydrogen probably trapped in microvoids. In this particular case the determination of the total H content by IR spectroscopy leads to substantial errors. At silane concentrations below 6%, the hydrogen content decreases sharply and the material becomes progressively microcrystalline. The features observed in the IR-absorption modes can be clearly assigned to mono- and/or dihydride bonds on (100) and (111) surfaces in silicon crystallites. The measurements presented here constitute a further indication for the validity of the proportionality constant of Shanks et al. [Phys. Status Solidi B 110, 43 (1980)], generally used to estimate the hydrogen content in "conventional'' amorphous silicon films from IR spectroscopy; additionally, they indicate that this proportionality constant is also valid for the microcrystalline samples. © 1996 American Institute of Physics.
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 5111-5115 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Hydrogenated microcrystalline silicon (μc-Si:H) deposited by VHF plasma-enhanced chemical vapor deposition has recently been proven to be fully stable, with respect to light-induced degradation, when adequately used in p-i-n solar cells. Stable solar cells efficiencies of 7.7% have been obtained with single-junction cells, using "midgap'' microcrystalline i-layers, having an optical gap of around 1 eV. In the present paper, the electronic transport properties of such microcrystalline layers are determined, by the steady-state photocarrier grating method (SSPG) and steady-state photoconductivity measurements, in a coplanar configuration. The conditions for the validity of the procedure for determining the ambipolar diffusion length, Lamb, from SSPG measurements (as previously theoretically derived in the context of amorphous silicon) are carefully re-examined and found to hold in these μc-Si:H layers, taking certain additional precautions. Otherwise, e.g., the prevalence of the "lifetime'' regime (as opposed to the "relaxation time'' regime) becomes questionable, in sharp contrast with the case of amorphous semiconductors, where this condition is almost never a problem. For the best layers measured so far, Lamb is about twice as high and the photoconductivity σphoto four times as high in μc-Si:H, when compared to device quality a-Si:H. Until now, the highest values of Lamb found by the authors for μc-Si:H layers are around 3×10−5 cm. © 1996 American Institute of Physics.
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 6010-6012 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Assemblies of ferromagnetic cylinders made of Ni with diameters ranging from 35 to 250 nm were produced by electrodeposition in nanoporous membranes. The large coercive fields of Ni nanowires at low temperature could be accounted for by the curling mode of magnetization reversal, taking into account the distributions of wire diameters and orientations. The coercive field of the nanowires of the smaller diameter range decreased from 1500 Oe at 20 K to 200 Oe at 300 K nearly linearly. © 1996 American Institute of Physics.
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 712-716 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Microcrystalline silicon (μc-Si:H) layers deposited by the very high-frequency-glow discharge technique at a radio-frequency excitation of 70 MHz are observed to be basically slightly 〈n〉 type. By doping (so-called "microdoping'') with boron in the gas phase volume part per million (vppm) range, compensated material could be obtained. The influence of this doping on the electronic transport properties is documented. A pronounced onset of the boron incorporation into the films measured by secondary-ion-mass spectrometry is observed around 3 vppm (B2H6/SiH4), together with marked changes in the electrical properties. The compensated film obtained for a microdoping of about 1 vppm shows the lowest dark conductivity [3×10−8 (Ω cm)−1], the highest activation energy (517 meV), and, finally, the highest photoconductive gain of 6×103 (photo/dark current ratio). Depending on the value of the activation energy (the critical value is ≈0.2 eV), two different transport models are identified, corresponding to "Meyer–Neldel'' or "anti-Meyer–Neldel'' behavior. As for light-induced degradation, the compensated film exhibits better stability than undoped films. Finally, the use of slightly boron doped μc-Si:H as photovoltaically active material will be discussed. © 1995 American Institute of Physics.
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  • 7
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 65 (1994), S. 860-862 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Complete μc-Si:H p-i-n solar cells have been prepared by the very high frequency glow discharge method. Up to now, intrinsic μc-Si:H has never attracted much attention as a photovoltaic active material. However, an efficiency of 4.6% and remarkably high short circuit current densities of up to 21.9 mA/cm2 due to an enhanced absorption in the near-infrared could be obtained. First light-soaking experiments indicate no degradation for the entirely μc-Si:H cells. Voltage-dependent spectral response measurements suggest that the carrier transport in complete μc-Si:H p-i-n cells may possibly be cosupported by diffusion (in addition to drift).
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  • 8
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 65 (1994), S. 3019-3021 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A new technique is required which enables tailoring of the morphology of a metallic nanostructured material down to the 10 nm length scale. Using nanoporous nuclear track etched membranes as templates for electrodeposition, an assembly of wires with diameters as low as 30 nm could be obtained. Alternating the electrodeposition of two metals resulted in multilayers grown perpendicular to the wire axis. Layer thicknesses as low as 2 nm could be reached. Application is demonstrated by making wires 6 μm long, 80 nm in diameter, having a succession of either Co and Cu layers or of (Ni,Fe) and Cu layers. Wires containing layers of 5–10 nm in thickness exhibited a giant magnetoresistance. The current was naturally perpendicular to the layers. At ambient temperature, a magnetoresistance of 14% for Co/Cu and of 10% for (Fe,Ni)/Cu was observed. © 1994 American Institute of Physics.
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 66 (1995), S. 2370-2372 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Radioactive isotopes are produced by nuclear reactions in a thin target foil. The recoiling products are directly implanted into samples mounted off-axis to the primary beam. Using proton or α beams and appropriate target foils, radioactive isotopes of Ti, V, Cr, Mn, and Co were implanted. The implantation parameters are presented and compared with other implantation techniques for radioactive isotopes. To demonstrate an application, a deep-level transient spectroscopy measurement on 48V in silicon is presented. Ti and V correlated band-gap levels were observed during the 48V decay. © 1995 American Institute of Physics.
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 69 (1996), S. 1373-1375 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: As-deposited undoped microcrystalline silicon (μc-Si:H) has in general a pronounced n-type behavior. Such a material is therefore often not appropriate for use in devices, such as p-i-n diodes, as an active, absorbing i layer or as channel material for thin-film transistors. In recent work, on p-i-n solar cells, this disturbing n-type character had been successfully compensated by the "microdoping'' technique. In the present letter, it is shown that this n-type behavior is mainly linked to oxygen impurities; therefore, one can replace the technologically delicate microdoping technique by a purification method, that is much easier to handle. This results in a reduction of oxygen impurities by two orders of magnitude; it has, furthermore a pronounced impact on the electrical properties of μc-Si:H films and on device performance, as well. Additionally, these results prove that the unwanted donor-like states within μc-Si:H are mainly due to extrinsic impurities and not to structural native defects. © 1996 American Institute of Physics.
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