ISSN:
1551-2916
Source:
Blackwell Publishing Journal Backfiles 1879-2005
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
The effects of trace O2 levels on the nitridation of compacts made from silane-derived Si powders were studied in N2 atmospheres, with oxygen levels of either 5 ppm or 10 ppb (approximately). The nitriding kinetics were studied by thermogravimetric analysis as a function of temperature (1100–1200°C) and heating rate (5°C/min and 100°C/min). Reducing the O2 level in the nitriding gas enhanced conversion to Si3N4 at lower temperatures, reduced the composition variations within the samples, and decreased the α/β ratios. The results suggest that nucleation and rapid growth of Si3N4 at relatively low temperatures are possible only when the oxygen partial pressure in the system is below the threshold value for passive oxidation.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1111/j.1151-2916.1999.tb02133.x
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