Publication Date:
2014-01-01
Description:
p-type hydrogenated microcrystalline silicon oxide (µc-SiOx:H) was developed and implemented as a contact layer in hydrogenated amorphous silicon (a-Si:H) single junction solar cells. Higher transparency, sufficient electrical conductivity, low ohmic contact to sputtered ZnO:Al, and tunable refractive index make p-type µc-SiOx:H a promising alternative to the commonly used p-type hydrogenated microcrystalline silicon (µc-Si:H) contact layers. In this work, p-type µc-SiOx:H layers were fabricated with a conductivity of up to 10−2 S/cm and a Raman crystallinity of above 60%. Furthermore, we present p-type µc-SiOx:H films with a broad range of optical properties (2.1 eV 〈 band gapE04
Print ISSN:
1110-662X
Electronic ISSN:
1687-529X
Topics:
Electrical Engineering, Measurement and Control Technology
,
Energy, Environment Protection, Nuclear Power Engineering
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