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  • 1
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: This letter reports an investigation of two unique dual inlaid metallization approaches with low pressure chemical vapor deposition (LPCVD) of aluminum (Al) for sub-0.35 μm ultra-large-scale-integration interconnect technology: (1) warm Al/CVD Al/coherent (coh.) PVD Al/coh. PVD Ti and (2) warm PVD Al/CVD Al/coh. PVD Ti or Al/selective CVD Al. The integration of thin coh. PVD Al, deposited with a physical collimator or a variation of ionized metal plasma technique, was found to be the unique and simple solution in providing void-free via and interconnect structures, which have not been reported elsewhere. Excellent electrical and electromigration results have been obtained. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 82 (1997), S. 1563-1577 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Plastic deformation in submicron wide Al-1 wt %Cu interconnects was studied in situ using a straining device in the transmission electron microscope. Dislocation motion occurred readily in unpassivated lines but was nonexistent in passivated lines due to the presence of stiff oxide sidewalls. Instead heterogeneous void nucleation occurred on straining to a critical limit. The void morphology was always near hemispherical and the nucleation always took place at the line edges. Further stretching of the lines led to a rupture of the sidewalls away from the lines, resulting in immediate dislocation motion. Void nucleation, cross slip, and operation of dislocation sources at line edges were all recorded on video. It was noted that dislocations almost parallel to the plane of the lines are rarely observed and furthermore, their movement is sluggish. Based on the dislocation configuration observed in these lines, a generalized geometrical model was arrived at in order to determine the significance of grain orientation on yield stress of passivated lines with columnar, bamboo grains. Frequent occurrence of twinning within the grains indicated that plastic deformation was indeed restricted in confined metal lines. © 1997 American Institute of Physics.
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 90 (2001), S. 732-740 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The detection of early failures in electromigration (EM) and the complicated statistical nature of this important reliability phenomenon have been difficult issues to treat in the past. A satisfactory experimental approach for the detection and the statistical analysis of early failures has not yet been established. This is mainly due to the rare occurrence of early failures and difficulties in testing of large sample populations. Furthermore, experimental data on the EM behavior as a function of varying number of failure links are scarce. In this study, a technique utilizing large interconnect arrays in conjunction with the well-known Wheatstone Bridge is presented. Three types of structures with a varying number of Ti/TiN/Al(Cu)/TiN-based interconnects were used, starting from a small unit of five lines in parallel. A serial arrangement of this unit enabled testing of interconnect arrays encompassing 480 possible failure links. In addition, a Wheatstone Bridge-type wiring using four large arrays in each device enabled simultaneous testing of 1920 interconnects. In conjunction with a statistical deconvolution to the single interconnect level, the results indicate that the electromigration failure mechanism studied here follows perfect lognormal behavior down to the four sigma level. The statistical deconvolution procedure is described in detail. Over a temperature range from 155 to 200 °C, a total of more than 75 000 interconnects were tested. None of the samples have shown an indication of early, or alternate, failure mechanisms. The activation energy of the EM mechanism studied here, namely the Cu incubation time, was determined to be Q=1.08±0.05 eV. We surmise that interface diffusion of Cu along the Al(Cu) sidewalls and along the top and bottom refractory layers, coupled with grain boundary diffusion within the interconnects, constitutes the Cu incubation mechanism. © 2001 American Institute of Physics.
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  • 4
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 62 (1993), S. 2443-2445 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Al-Si-Cu alloy films sputter-deposited on reactively ion-sputtered TiN/Ti/SiO2 substrates were characterized and evaluated for interconnect reliability. Using x-ray diffraction techniques, both TiN and Al microstructures were analyzed and the (111) intensities of the latter correlated with the electromigration median time to fail (MTTF). The values of the MTTF increased with the Al(111) intensities for the TiN/Ti/SiO2 substrates annealed below 400 °C. A progressive decrease in both the Al(111) texture and MTTF was observed for substrates annealed above this temperature. While the improved Al(111) texture has been attributed to an improved TiN barrier textured in the (111) crystal plane (anneals below 400 °C), a TiO2 layer over the TiN barrier has been found responsible for the degradation of the Al(111) texture and the MTTF for barrier anneals above 400 °C.
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  • 5
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 65 (1994), S. 1900-1902 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Size, density, and morphology of particulates in helium-diluted silane rf plasmas are studied using a scanning electron microscopic method. The experimental results show that particulates grow through three phases of nucleation, rapid growth, and growth saturation. Particulates in two different size ranges coexist after the initiation of the rapid growth phase, the size distribution of particulates in each size group is found to be well expressed by both the lognormal and normal distributions with a narrow size dispersion, and coagulation of particulates plays a crucial role in the rapid growth phase. The dependencies of size and density of particulates in the large-size group on rf-power-on period are very similar to their temporal evolutions obtained by an in situ laser light scattering method. © 1994 American Institue of Physics.
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  • 6
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 67 (1995), S. 3880-3882 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Discharge frequency dependence of growth of particulates is studied in high frequency silane plasmas. Particulates appear earlier after discharge initiation and the increasing rate of their amount in the subsequent phase decreases with increasing the discharge frequency from 3.5 to 28 MHz. Even in the early phase of their formation for all 3.5–28 MHz discharges, particulates grow principally around the plasma/sheath boundary near the powered electrode, where short lifetime radicals are actively generated. For 28 MHz, the density of particulates in the early discharge phase is extremely high (≥1011 cm3). The latter two features suggest that many short lifetime neutral radicals (such as SiH2), being produced at a high rate, significantly contribute to the nucleation and initial growth of one particulate, at least, for a relatively high power density of the order of 0.5 W/cm2. © 1995 American Institute of Physics.
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  • 7
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 76 (2000), S. 843-845 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The early failure issue in electromigration (EM) has been an unresolved subject of study over the last several decades. A satisfying experimental approach for the detection and analysis of early failures has not been established yet. In this study, a technique utilizing large interconnect arrays in conjunction with the well-known Wheatstone Bridge is presented. A total of more than 20 000 interconnects were tested. The results indicate that the EM failure mechanism studied here follows lognormal behavior down to the four sigma level. © 2000 American Institute of Physics.
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 82 (1997), S. 171-181 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Plastic deformation in passivated Al-1 wt %Cu thin films was studied in situ using a straining device in the transmission electron microscope. Both edge and screw dislocations were found to have caused slip on inclined {111} planes. Multiple slip was frequently observed as two or more sets of intersecting slip traces. Microstructural investigations of both unpassivated and passivated Al-1 wt %Cu films indicate that grain size and encapsulation by passivating layers are major contributors to strength of a thin film with a particular thickness. Additional strengthening is also provided by interactions between dislocations on multiple slip systems. The roles of grain orientation and precipitates in plastic deformation are also discussed. © 1997 American Institute of Physics.
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  • 9
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Analytical Biochemistry 207 (1992), S. 193-196 
    ISSN: 0003-2697
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Biology , Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Analytical Biochemistry 182 (1989), S. 366-370 
    ISSN: 0003-2697
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Biology , Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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