ISSN:
1662-9752
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
In this paper, helium-charged nanocrystalline Ti films with different bias voltages were deposited by the He-Ar magnetron co-sputtering method. XRD was used to investigate the microstructure of the He-Ti film. Meanwhile, in order to find out the factors of affecting the growth and size of helium clusters, kinetic Monte Carlo (KMC) simulation was carried out to study the growth of helium cluster, based on the simulation of helium behavior in titanium using molecular dynamics
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/02/20/transtech_doi~10.4028%252Fwww.scientific.net%252FMSF.607.192.pdf
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