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  • 1
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Journal of medicinal chemistry 15 (1972), S. 99-101 
    ISSN: 1520-4804
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Journal of medicinal chemistry 15 (1972), S. 553-554 
    ISSN: 1520-4804
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Journal of medicinal chemistry 15 (1972), S. 999-1000 
    ISSN: 1520-4804
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Journal of medicinal chemistry 15 (1972), S. 1000-1001 
    ISSN: 1520-4804
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Journal of medicinal chemistry 17 (1974), S. 378-380 
    ISSN: 1520-4804
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 66 (1989), S. 6132-6137 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Positron annihilation spectroscopy (PAS) was performed in a Doppler mode to characterize the negatively charged grain-boundary defect, V'Zn, in ZnO varistor. The PAS study was conducted as a function of annealing treatment. As the annealing temperature increases from 400 to 600 °C the concentration of VZn increases, at intermediate temperatures from 600 to 800 °C the V'Zn concentration decreases, and finally, beyond 800 °C it increases again. These results are explained in terms of a grain-boundary defect model presented earlier [T. K. Gupta and W. G. Carlson, J. Mater. Sci. 20, 3487 (1987)]. The effect of quenching on PAS response was also explained in terms of a defect model.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 60 (1986), S. 607-611 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Specific heat data are reported on pure and varistor ZnO, 1.7–25 K, and thermal conductivity data are reported on varistor ZnO, 1.7–15 K. In pure ZnO interstitials give rise to an Einstein contribution (ωE=84 cm−1) to the specific heat above 10 K and to a Schottky contribution (δ(approximately-equal-to)10−5 eV) below 4 K due possibly to ordering. The calorimetric Debye temperature is 399.5 K. In varistor ZnO the specific heat is dominated below 20 K by compensating charge densities (∼1018 cm−3) on the interfacial barriers which give rise to two Schottky terms (δ=7×10−4 and 3×10−3 eV). All of these non-Debye excitations are localized (do not carry heat). No evidence is seen in the thermal conductivity for Kapitza-resistance effects at the heavily doped grain boundaries.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 68 (1990), S. 851-855 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Following an earlier study on the temperature dependence of the resistive component of the leakage current of a ZnO varistor, a detailed study has been undertaken in this paper to compare the temperature dependence of the resistive (IR), capacitive (IC), and total (IT) leakage currents between unannealed and 600 °C annealed samples. It is shown that, as before, an Arrhenius plot of IC and IR versus temperature can best be represented by a break in the plot comprising a high-temperature regime (125–165°C) with a high activation energy and a low-temperature regime (30–100 °C with a low activation energy. The activation energies of IR-T curves are generally higher than those of IC-T curves in both temperatures regimes. Upon annealing at the critical temperature of 600 °C, the activation energy changes for both current components, accompanied by increased stability of the varistor. For IR, the activation energy becomes higher in the low-temperature regime in agreement with previous observation, and for IC, it becomes lower in the higher-temperature regime. The relative contributions of these two current components on total current are also different in the two temperature regimes. In the low-temperature regime, the total current is mostly capacitive, and in the high-temperature regime, it is mostly resistive. The varistor is thus prone to more Joule heating in the high-temperature regime than in the low-temperature regime.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 68 (1990), S. 845-850 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The ZnO varistor is known to require a postsintering heat treatment (annealing) to impart stability to an otherwise unstable device, when subjected to an applied voltage stress. A large body of experimental data in the literature indicate that the most desirable temperature of annealing is between 600 and 700 °C at which the varistor becomes highly stable. This paper is aimed at understanding the significance of this annealing temperature from the analysis of the activation energies, estimated from the Arrhenius plots of the resistive current versus temperature in the prebreakdown region. It is found that the activation energy in the annealing temperature range of 600–700 °C is significantly higher than at any other annealing temperature between 500 and 800 °C. This conclusion is borne out by the statistical evaluation of the experimental data. When this result is combined with the equally notable observations in the literature that the interface state density [J. Mater. Sci. 20, 3487 (1985)], the grain-boundary trap density [J. Appl. Phys. 63, 5375 (1988)], and the density of the negatively charged zinc vacancy at the interface [J. Appl. Phys. 66, 6132 (1989)] are all reduced, also at the same annealing temperature range, it becomes clear that the annealing temperature of 600–700 °C is very unique to varistor stability. The significance of these observations is that the annealing and accompanying stability should be recognized as a very complex process that brings fundamental changes in the grain-boundary junction characteristic of the polycrystalline ceramic.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 8380-8386 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Positron-annihilation spectroscopy (PAS) was used in the lifetime mode to study changes in the grain-boundary defect equilibrium associated with dc-bias-induced degradation of a ZnO varistor. The PAS lifetime spectra were collected while the sample was under an applied bias ranging from 100 V ( ∼ 400 V/cm) to 500 V ( ∼ 2000 V/cm). The current through the sample was continuously monitored. The simple trapping model was used to interpret the lifetime PAS results and to obtain an estimate for the positron-capture rate. The experimental results show that an increase in the bias voltage results in a decrease in the positron-trap density and an increase in the positron lifetime associated with the dominant positron trap. These results are explained on the basis of a decrease in the concentration of negatively charged zinc vacancies at the grain boundary. The PAS results support the ion-migration model for degradation, which suggests that the bias-induced migration of positively charged zinc interstitials to the grain boundary reduces the concentration of negatively charged zinc vacancies at the boundary. This results in a reduction in the barrier height (degradation) and is consistent with the PAS data.
    Type of Medium: Electronic Resource
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