Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
65 (1989), S. 914-926
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
A new column design for the 25-kV vector-scan Gaussian beam lithography system is described. A field-emission gun, consisting of a three-element electrostatic lens and Zr/O/W〈100〉 cathode operated in a thermal-field mode for current stability, is combined in a demagnifying optics with a magnetic objective lens to focus a high-current-density (1000–3000 A/cm2) electron beam at high resolution (100–300 A(ring)) at the wafer plane without a severe reduction in field size. Optimum beam semiangle, focus mode, and column magnification are determined. The modified system retains the original deflection coils and pattern-generation system which allows immediate implementation of existing subfield stitching, chip registration, and proximity correction software.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.342993
Permalink
|
Location |
Call Number |
Expected |
Availability |