ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
A new type of cold cathode ion source has been designed that is suitable for beams of variable cross sections and can also employ source elements in any thermodynamic phase: it has been given the name universal cold cathode ion source (UCCIS). There are two versions of this ion source: the first (LE-UCCIS), suited to low energy operations such as ion beam assisted deposition (IBAD) and etching, the second (HE-UCCIS) suited to high energy processes such as ion implantation and ion mixing. A prototype of the LE-UCCIS has been built and is undergoing testing. The main feature of the LE-UCCIS when used for IBAD processes is to combine in a single unit both the source of neutrals that grow the film and the source of ions that assist the deposition
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1142854
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