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  • 1
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    The @journal of physical chemistry 〈Washington, DC〉 84 (1980), S. 3344-3346 
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Physics
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    The @journal of physical chemistry 〈Washington, DC〉 47 (1943), S. 645-649 
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Physics
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 90 (1989), S. 4198-4207 
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Notes: The chemiluminescence of IF produced by the I2+F2 reaction has been the subject of several works. In this paper, we present a study of this reaction under crossed beam conditions. The chemiluminescence spectrum has been recorded at several collision energies and the rovibrational distribution of the IF molecules has been deduced from the spectra by a linear least square fit. This distribution presents a strong vibrational inversion and extends to very high J values. It is very different from all the previously reported rovibrational distributions observed in the IF chemiluminescence. This result confirms that at least two different mechanisms contribute to populate the IF B state in the I2+F2 reaction, and our experiment is the first one to give the spectrum of the I2+F2 chemiluminescent reaction occurring in a single collision regime.
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 88 (2000), S. 96-104 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Epitaxial metastable Ge1−yCy alloy layers with y≤0.02 were grown on Ge(001) at temperatures Ts=200–550 °C using hyperthermal Ge and C beams with average energies of 16 and 24 eV, respectively, in order to investigate C incorporation pathways in the Ge lattice. High-resolution reciprocal lattice maps show that all as-deposited alloy layers are fully coherent with the substrate. Layers grown at Ts≤350 °C are in compression due to higher C concentrations in interstitial than in substitutional sites. The compressive strain decreases (i.e., the substitutional C concentration increases) with increasing Ts within this temperature range. At higher growth temperatures, as-deposited alloys are nearly strain free since the majority of the incorporated C is trapped at extended defects. Annealing the Ge1−yCy layers at Ta=450 and 550 °C leads to a significant increase, proportional to the strain in the as-deposited films, in compressive strain. Further annealing at Ta=650 °C results in the formation of dislocation loops which act as sinks for interstitial and substitutional C atoms and thus relieves residual macroscopic strain. Finally, we show that the large compressive strain associated with interstitial C atoms must be accounted for in order to determine the total incorporated C fraction from diffraction analyses. © 2000 American Institute of Physics.
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  • 5
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We use a combination of in situ and postdeposition experimental probes together with ab initio calculations of strain coefficients and formation energies associated with specific C configurations in the Si lattice to determine C incorporation pathways and lattice site distributions in fully coherent Si1−yCy alloy layers grown by molecular-beam epitaxy on Si(001) as a function of deposition temperature Ts (380 °C–680 °C) and C fraction y (0–0.026). Lattice strain and Raman spectroscopy measurements demonstrate that all C, irrespective of y, is incorporated into substitutional lattice sites in Si1−yCy(001) layers grown at Ts≤480 °C. Increasing Ts≥580 °C leads to strong C surface segregation, as shown by in situ angle-resolved x-ray photoelectron spectroscopy, yielding additional pathways for C incorporation. Photoluminescence measurements indicate that an increasing fraction of the incorporated C in the higher-temperature layers resides in dicarbon complexes. Reflection high-energy electron diffraction and cross sectional transmission electron microscopy reveal surface roughening at Ts≥580 °C with the formation of bulk planar structures, interconnected by {113} segments, that are periodic along [001] with a periodicity which decreases with increasing Ts. We interpret the planar structures as layers of C-rich Si1−yCy which form in the presence of excess surface C resulting from segregation. Our ab initio density functional calculations show that substitutional C arranged in an ordered Si4C phase is 0.34 eV per C atom more stable than isolated substitutional C atoms. © 2002 American Institute of Physics.
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 90 (2001), S. 3910-3918 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Epitaxial metastable Ge1−yCy alloy layers with y≤0.035 were grown on Ge(001) from hyperthermal Ge and C atomic beams at deposition temperatures Ts of 250 and 300 °C. The use of hyperthermal beams allows us to controllably vary the concentration of C incorporated as Ge–C split interstitials. Ge1−yCy layers grown with incident Ge-atom energy distributions corresponding to ≤0.14 lattice displacement per incident atom (dpa) are in a state of in-plane tension and contain significant concentrations of C atoms incorporated in substitutional sites. Increasing the dpa to 0.24 yields layers in compression with C incorporated primarily as Ge–C split interstitials. Ab initio density functional calculations of the formation energies and strain coefficients associated with C atomic arrangements in Ge show that configurations containing multiple C atoms, referred to collectively as C nanoclusters, are energetically more favorable than substitutional C and Ge–C split interstitials and yield a nearly zero average strain. In contrast, substitutional C and Ge–C split interstitials produce large tensile and compressive strains, respectively. Using the calculated strain coefficients, measured layer strains obtained from high-resolution reciprocal lattice maps, and substitutional C concentrations determined by Raman spectroscopy, we obtain the fraction of C atoms incorporated in substitutional, Ge–C split interstitial, and nanocluster sites as a function of the total C concentration y and Ts. We find that at low y and Ts values, all C atoms are incorporated in single-C configurations: substitutional C and Ge–C split interstitials. Their relative concentrations are controlled by the dpa through the production of near-surface Ge self-interstitials which are trapped by substitutional C atoms to form Ge–C split interstitials. Increasing y and Ts, irrespective of the dpa, leads to an increase in the fraction of C nanoclusters, while the fractions of substitutional C and Ge–C split interstitials decrease, due to the higher C–C encounter probability at the growth surface. © 2001 American Institute of Physics.
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  • 7
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Analytical chemistry 20 (1948), S. 610-613 
    ISSN: 1520-6882
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 91 (2002), S. 3644-3652 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Epitaxial metastable Ge1−yCy alloy layers with y≤0.045 were grown on Ge(001) by solid-source molecular-beam epitaxy (MBE) at temperatures Ts=200–400 °C. Using calculated strain coefficients and measured layer strains obtained from high-resolution reciprocal lattice maps (HR-RLMs), we determine C lattice site distributions as a function of Ts and total C concentration y. HR-RLMs show that all as-deposited alloys are fully coherent with their substrates. Ge1−yCy(001) layers grown at Ts≤350 °C are in a state of in-plane tension and contain C in substitutional sites, giving rise to tensile strain, as well as in nanocluster sites which induce negligible lattice strain. Ts=400 °C layers are strain neutral with negligible substitutional C incorporation. Increasing y and/or Ts leads to a decrease in substitutional C concentration, consistent with Raman spectroscopy results, with a corresponding increase in the C fraction incorporated in nanocluster sites. The latter suggests that nanocluster formation is kinetically limited during film deposition by the C–C adatom encounter probability at the growth surface. Overall, the results show that it is not possible by MBE to obtain fully substitutional C incorporation in Ge1−yCy(001) alloys, irrespective of y and Ts. This is consistent with ab initio density functional calculations results showing that C incorporation in nanoclusters sites is energetically favored over incorporation in substitutional Ge lattice sites. Annealing the Ge1−yCy(001) layers at Ta=550 °C leads to a significant decrease in the substitutional C fraction and, hence, lower tensile strain. Layers annealed at 650 °C are strain free as all substitutional C has migrated to lower-energy nanocluster sites. © 2002 American Institute of Physics.
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  • 9
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Analytical chemistry 34 (1962), S. 861-862 
    ISSN: 1520-6882
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Industrial & engineering chemistry 39 (1947), S. 262-266 
    ISSN: 1520-5045
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Process Engineering, Biotechnology, Nutrition Technology
    Type of Medium: Electronic Resource
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