ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Chemically assisted ion beam etching (CAIBE) has been used to etch InGaAsP/InP ridge laser facets. Smooth, vertical facets 4 μm deep have been etched using Ar/Cl2 CAIBE with a beam voltage of 440 V and a beam current density of 0.08 mA/cm2. Room temperature and high temperature (85 °C) L-I characteristics and device performance have been evaluated, as well as the performance of integrated back facet monitors. Output powers of 9.5 mW from the laser and a monitor current of 3.75 mA have been obtained.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.109327
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