ISSN:
0032-3888
Keywords:
Chemistry
;
Chemical Engineering
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
Variation in line width caused by light scattered from the substrate (reflective notching) is a major problem in VLSI lithography. This paper demonstrates the reduction of reflective notches using a resist with increased absorptivity (a dyed resist). The optimal set of process conditions which minimize line width variations is explored.
Additional Material:
7 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/pen.760261618
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