Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
58 (1991), S. 2631-2633
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Deposition rates and film thicknesses have been observed to be a key parameter for the grain growth and surface-energy-driven secondary grain growth of the as-deposited thin Sb films prepared by thermal evaporation. At a low deposition rate and thinner-film thickness (∼260 A(ring)), (003) grains which have the lowest surface energy are observed to account for approximately 90% of the microstructure. Whereas at high deposition rate and greater film thickness (∼1300 A(ring)), an almost random grain orientation was observed from x-ray diffraction data. After thermal annealing at 450 °C, secondary grains grew to show preferred orientation in all the films. Also, film thickness has been found to be an important factor on the succeeding microstructure after thermal annealing.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.104816
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