ALBERT

All Library Books, journals and Electronic Records Telegrafenberg

feed icon rss

Your email was sent successfully. Check your inbox.

An error occurred while sending the email. Please try again.

Proceed reservation?

Export
  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 6819-6826 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Intentional oxygen incorporation, using diethyl aluminum ethoxide [(C2H5)2AlOC2H5] during metalorganic vapor phase epitaxy GaAs was found to compensate C and Zn shallow acceptors as well as Si and Se shallow donors, due to the oxygen-related multiple deep levels within the GaAs band gap. Deep level transient spectroscopy (DLTS) was used to characterize the energy levels associated with these oxygen deep centers. The total measured trap concentration from DLTS can account for the observed compensation in n-type GaAs:O. The total trap concentration in p-type GaAs:O, however, was found to be lower than the observed compensation by a factor of ∼100. These oxygen deep centers exhibit multiple electronic states which have been associated with the local number of Al nearest neighbors and the microscopic structure of the defect. The concentration and nature of these deep levels were not influenced by the chemical identity of the shallow dopants. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 1175-1179 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Semi-insulating epitaxial GaAs:O prepared in a metalorganic vapor-phase epitaxy growth process using DEALO [(C2H5)2AlOC2H5] as the oxygen source has been characterized by temperature-dependent (12–300 K) photoluminescence. Oxygen-related deep level photoluminescence bands were detected at ∼0.8 and ∼1.1 eV. The relative intensities of the two bands were sensitive to both oxygen concentration and temperature. At a given temperature, an increase in oxygen concentration led to an increase in the intensity of the lower energy band relative to the higher energy band. A similar effect occurred at a given oxygen concentration as the temperature was raised. Band edge luminescence was also measured and was observed to quench when the oxygen concentration exceeded ∼1018 cm−3. The results indicate that oxygen is incorporated differently in epitaxial GaAs than in bulk GaAs. We propose that the difference is due to the incorporation of Al when DEALO is used in the growth of epitaxial GaAs:O. We suggest equally plausible microscopic models, based on the number of nearest-neighbor Al associated with O and multiple charge states, to explain the properties of the oxygen-related photoluminescence.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 82 (1997), S. 2263-2269 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The mixed Group V ternary alloy GaAs1−yPy (y〈0.17) has been grown by metal organic vapor phase epitaxy and doped with oxygen using the oxygen precursor, diethylaluminum ethoxide [C2H5OAl(C2H5)2]. Controlled oxygen doping was accomplished over the range of 0〈y〈0.17. Deep level transient spectroscopy measurements reveal the presence of several oxygen-related deep levels. These levels, previously found in GaAs:O, vary with alloy composition over the investigated range. An additional deep level, most probably associated with the presence of misfit-related defects, has been identified. Photoluminescence performed on the oxygen-doped samples indicates that band edge emission is reduced and lower energy emission features are introduced over the wavelength range of 1000–1200 nm as a result of oxygen incorporation. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 83 (1998), S. 4918-4927 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The photoluminescence properties of GaAs:Er doped with a new pyrazole and pyridine-based Er source, tris(3,5-di-tert-butylpyrazolato)bis(4-tert-butylpyridine)erbium(III), were investigated. These samples showed significantly stronger and sharper 1.54 μm Er3+ luminescence than in GaAs:Er samples doped with cyclopentadienyl-based Er sources. The efficient luminescence was associated with the Er–2O center, formed with unintentional oxygen impurities. The Er3+ emission was greatly reduced in n-type samples, whereas the emission remained strong in p-type samples. This trend suggests that either the free hole concentration is very important to the Er3+ excitation efficiency, and/or there is a strong Auger quenching mechanism which involves free electrons. A model based on the results of a two-beam experiment indicates the presence of strong Auger energy transfer from the Er-bound exciton to a free electron. Auger energy transfer from the excited Er3+ ion to a free electron was found to be much less important. The temperature dependence of the Er3+ emission was also examined. A decrease in intensity was observed at the lowest temperatures. This effect was attributed to the freeze-out of carriers onto a relatively shallow trap which could be related to either Er or shallow acceptors. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 5
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 63 (1993), S. 2260-2262 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: High pressure studies of porous silicon reveal that a phase transition occurs at ∼170 kbar. The phase transition is detected by an abrupt change in color of porous silicon from orange-yellow to black. Photoluminescence measurements show an initial blue shift of the luminescence peak. At ∼25 kbar the blue shift ceases and a reversal of shift is observed. The red shift continues up to ∼90 kbar at which point the luminescence is quenched. The shift reversal is interpreted as a pressure-induced direct–indirect transition in porous silicon. The results are best explained in the context of the quantum confinement model.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 6
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 72 (1998), S. 1244-1246 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The photoluminescence of in situ-doped GaN:Er during hydride vapor phase epitaxy was compared to an Er-implanted GaN sample. At 11 K, the main emission wavelength of the in situ-doped sample is shifted to shorter wavelengths by 2.5 nm and the lifetime is 2.1±0.1 ms as compared to 2.9±0.1 ms obtained for the implanted sample. The 295 K band edge luminescence of the in situ-doped sample was free of the broad band luminescence centered at 500 nm which dominated the spectrum of the implanted sample. Reversible changes in the emission intensity of the in situ-doped sample upon annealing in a N2 versus a NH3/H2 ambient indicate the probable role of hydrogen in determining the luminescence efficiency of these samples. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 7
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    The @journal of physical chemistry 〈Washington, DC〉 99 (1995), S. 2384-2392 
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Physics
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 8
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Inorganic chemistry 33 (1994), S. 2000-2003 
    ISSN: 1520-510X
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 82 (1997), S. 368-374 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The photoluminescence properties of metal-organic chemical vapor deposition GaAs:Er were investigated as a function of temperature and applied hydrostatic pressure. The 4I13/2→4I15/2Er3+emission energy was largely independent of pressures up to 56 kbar and temperatures between 12 and 300 K. Furthermore, no significant change in the low temperature emission intensity was observed at pressures up to and beyond the Γ-X crossover at ∼41 kbar. In contrast, AlxGa1−xAs:Er alloying studies have shown a strong increase in intensity near the Γ-X crossover at x∼0.4. These results suggest that the enhancement is most likely due to a chemical effect related to the presence of Al, such as residual oxygen incorporation, rather than a band structure effect related to the indirect band gap or larger band gap energy. Modeling the temperature dependence of the 1.54 μm Er3+ emission intensity and lifetime at ambient pressure suggested two dominant quenching mechanisms. At temperatures below approximately 150 K, thermal quenching is dominated by a ∼13 meV activation energy process which prevents Er3+ excitation, reducing the intensity, but does not affect the Er3+ ion once it is excited, leaving the lifetime unchanged. At higher temperatures, thermal quenching is governed by a ∼115 meV activation energy process which deactivates the excited Er3+ ion, quenching both the intensity and lifetime. At 42 kbar, the low activation energy process was largely unaffected, whereas the higher activation energy process was significantly reduced. These processes are proposed to be thermal dissociation of the Er-bound exciton, and energy back transfer, respectively. A model is presented in which the Er-related electron trap shifts up in energy at higher pressure, increasing the activation energy to back transfer, but not affecting thermal dissociation of the bound exciton through hole emission. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 10
Close ⊗
This website uses cookies and the analysis tool Matomo. More information can be found here...