Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
88 (2000), S. 1401-1406
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The effect of intermixing on the apparent interface stress is studied in 〈111〉-textured dc-magnetron sputtered Au/Ni multilayers by use of two methods commonly used for determining interface stress. The method using profilometry and in-plane x-ray diffraction does not take intermixing into account and yields an apparent interface stress of −8.46±0.99 J m−2. However, observed discrepancies between model calculations and measured high-angle x-ray diffractograms indicate intermixing, and by use of the profilometry and sin2 ψ method the real interface stress value of −2.69±0.43 J m−2 is found. This method also reveals a significant and systematic change of the stress-free lattice parameter of both constituents as a function of modulation period which is shown to account for the difference between the two findings. The method using in-plane diffraction is thus shown to be inapplicable to interface stress determinations in systems exhibiting a modulation period-dependent stress-free lattice parameter. Finally, a deviation of the interface stress in the Au/Ni sample with the smallest modulation period as compared to specimens with larger bilayer lengths is observed to be concurrent with a significant decrease in the interface roughness measured by x-ray reflectivity, which suggests that the deviation is of geometrical origin. © 2000 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.373830
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