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  • 1
    Electronic Resource
    Electronic Resource
    Macroparticle-free thin films produced by an efficient vacuum arc deposition technique (1993)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 4239-4241 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Macroparticle-free films of various metals and diamond-like carbon have been obtained by a pulsed vacuum arc deposition technique. An axial magnetic field (100–200 mT) generated by the discharge current itself was used to focus the plasma produced by the cathode spots and to guide the plasma flow through a macroparticle filter. The films were characterized by scanning electron microscopy, atomic force microscopy, and Rutherford backscattering spectrometry. They were found to be macroparticle-free. The total efficiency of the combined gun-filter plasma source is even higher than a standard nonfiltered vacuum arc plasma source in terms of deposited film thickness per discharge, because the plasma losses in the filter are overcompensated by the focused plasma injection into the filter.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.354431
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  • 2
    Electronic Resource
    Electronic Resource
    Ion flux from vacuum arc cathode spots in the absence and presence of a magnetic field (2002)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 91 (2002), S. 4824-4832 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Because plasma production at vacuum cathode spots is approximately proportional to the arc current, arc current modulation can be used to generate ion current modulation that can be detected far from the spot using a negatively biased ion collector. The drift time to the ion detector can used to determine kinetic ion energies. A very wide range of cathode materials have been used. It has been found that the kinetic ion energy is higher at the beginning of each discharge and approximately constant after 150 μs. The kinetic energy is correlated with the arc voltage and the cohesive energy of the cathode material. The ion erosion rate is in inverse relation to the cohesive energy, enhancing the effect that the power input per plasma particle correlates with the cohesive energy of the cathode material. The influence of three magnetic field configurations on the kinetic energy has been investigated. Generally, a magnetic field increases the plasma impedance, arc burning voltage, and kinetic ion energy. However, if the plasma is produced in a region of low field strength and streaming into a region of higher field strength, the velocity may decrease due to the magnetic mirror effect. A magnetic field can increase the plasma temperature but may reduce the density gradients by preventing free expansion into the vacuum. Therefore, depending on the configuration, a magnetic field may increase or decrease the kinetic energy of ions. © 2002 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1459619
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  • 3
    Electronic Resource
    Electronic Resource
    Correlation between cathode properties, burning voltage, and plasma parameters of vacuum arcs (2001)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 89 (2001), S. 7764-7771 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Burning voltages of vacuum arcs were measured for 54 cathode materials and compared with literature data. As anticipated, a correlation between the arc burning voltage and the plasma temperature was found. However, more importantly, a correlation between the cohesive energy of the cathode material and the arc burning voltage could be demonstrated. This link between a cathode material property, the cohesive energy, and a discharge property, the arc burning voltage, is essential for the operation of the vacuum arc discharge because is determines the plasma temperature. Energy balance considerations show that this "cohesive energy rule" is responsible for several other secondary relationships, such as the correlation between the mean ion charge state and the boiling temperature of the cathode. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1371276
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  • 4
    Electronic Resource
    Electronic Resource
    Vacuum arc ion source with filtered plasma for macroparticle-free implantation : Proceedings of the 5th international conference on ion sources (1994)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 1319-1321 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: An inherent feature of the vacuum arc discharge is that small droplets of micrometer size (macroparticles) are produced along with the plasma in the cathode spots. Droplet contamination of the substrate can occur when implanting metal ions using a vacuum arc ion source. The contamination can be significant for some cathode materials such as lead and other low melting point metals, which for some ion implantation applications such as for semiconductor doping and metallic corrosion inhibition can be a detriment. We have developed a vacuum arc ion source in which the plasma is filtered before the ions are extracted. By guiding the arc-produced plasma through a 60° bent magnetic duct, macroparticles are completely removed from the plasma. No additional power supply for the guiding magnetic field is required since the pulsed arc current itself is used to drive the magnetic solenoid. Tests have shown that macroparticle-free metal ion implantation can be done while maintaining the high ion beam current typical of vacuum arc ion sources.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1144997
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  • 5
    Electronic Resource
    Electronic Resource
    Efficient, compact power supply for repetitively pulsed, "triggerless" cathodic arcs (1999)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 70 (1999), S. 4532-4535 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A power supply for "triggerless," repetitively pulsed cathodic arcs has been developed. It is based on a thyristor-switched, high-voltage, high-current, pulse-forming network (PFN). It can provide high pulsed currents (up to 2 kA), with duration of 600 μs, and pulse repetition rate of up to 10 Hz. Higher repetition rates are possible at lower current. The rectangular pulse shape and amplitude are reproducible to within a few percent. Cathodic arc initiation is extremely reliable because the charging voltage is much higher than the minimum starting voltage for the triggerless arc initiation method. The energy utilization efficiency is very high by intentionally mismatching load and PFN impedances and by using an efficiency-enhancing diode; the stored energy is dissipated primarily in the arc.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1150106
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  • 6
    Electronic Resource
    Electronic Resource
    High ion charge states in a high-current, short-pulse, vacuum arc ion source : Proceedings of the 6th international conference on ion sources (1996)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 67 (1996), S. 1202-1204 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Ions of the cathode material are formed at vacuum arc cathode spots and extracted by a grid system. The ion charge states (typically 1–4) depend on the cathode material and only a little on the discharge current as long as the current is low. Here we report on experiments with short pulses (several μs) and high currents (several kA); this regime of operation is thus approaching a more vacuum sparklike regime. Mean ion charge states of up to 6.2 for tungsten and 3.7 for titanium have been measured, with the corresponding maximum charge states of up to 8+ and 6+, respectively. The results are discussed in terms of Saha calculations and freezing of the charge state distribution. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1146731
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  • 7
    Electronic Resource
    Electronic Resource
    Ion charge state distributions of pulsed vacuum arc plasmas in strong magnetic fields : Proceedings of the 7th international conference on ion sources (1998)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 69 (1998), S. 1332-1335 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Vacuum arc plasmas with discharge currents of 300 A and duration 250 μs have been produced in strong magnetic fields up to 4 T. Ion charge state distributions have been measured for C, Al, Ag, Ta, Pt, Ho, and Er with a time-of-flight charge-mass-spectrometer. Our previous measurements have been confirmed which show that ion charge states can be considerably enhanced when increasing the magnetic field up to about 1 T. The new measurements address the question of whether or not the additional increase continues at even higher magnetic field strength. It has been found that the increase becomes insignificant for field strengths greater than 1 T. Ion charge state distributions are almost constant for magnetic field strengths between 2 and 4 T. The results are explained by comparing the free expansion length with the freezing length. The most significant changes of charge state distributions are observed when these lengths are similar. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1148801
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  • 8
    Electronic Resource
    Electronic Resource
    Characterization of a low-energy constricted-plasma source : Proceedings of the 7th international conference on ion sources (1998)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 69 (1998), S. 1340-1343 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: The construction and principle of operation of the constricted-plasma source are described. A supersonic plasma stream is produced by a special form of a dc-glow discharge, the constricted glow discharge. The discharge current and gas flow pass through an orifice of small diameter (constriction) which causes a space charge double layer but also serves as a nozzle to gas-dynamically accelerate the plasma flow. Plasma parameters have been measured using Langmuir probes, optical emission spectroscopy, and a plasma monitor for mass-resolved energy measurements. Experiments have been done with nitrogen as the discharge gas. It was found that the energy distribution of both atomic and molecular ions have two peaks at about 5 and 15 eV, and the energy of almost all ions is less than 20 eV. The ionization efficiency decreases with increasing gas flow. The downstream plasma density is relatively low but activated species such as excited molecules and radicals contribute to film growth when the source is used for reactive film deposition. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1148803
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  • 9
    Electronic Resource
    Electronic Resource
    A filamentless ion source for materials processing : Proceedings of the 7th international conference on ion sources (1998)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 69 (1998), S. 880-882 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A dual-stage, multiaperture gas ion source with 5 cm beam diameter has been built and characterized. The first discharge stage is a constricted glow discharge injecting a plasma stream into a discharge cavity supporting a Penning ion gauge discharge in the low pressure mode. Both discharge stages and ion extraction are fed by a single, grounded power supply. This simplifies the electrical setup and reduces costs. Various gases have been tested including nitrogen, oxygen, and argon. The ion beam current density is 250 μA/cm2, i.e., the beam current is about 5 mA, at an extraction voltage of 3.0 kV and a discharge current of 59 mA. Measurements of the ion beam current as a function of various parameters such as the discharge voltage and current, gas flow, and magnetic field are presented. The source is compact and can be easily adapted to various materials modification applications in which ion energies of a few keV are required. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1148470
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  • 10
    Electronic Resource
    Electronic Resource
    Vacuum arc ion sources: Some vacuum arc basics and recent results (invited) : Proceedings of the 5th international conference on ion sources (1994)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 1253-1258 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Vacuum arc ion sources have been developed and used in a growing number of laboratories around the world. Primary applications of this high current metal ion source have evolved for metallurgical ion implantation and for accelerator injection. Novel source versions and features have been developed, including an electronically switchable "partitioned cathode'' whereby the metal species generated can be switched from pulse to pulse, a combined metal/gaseous source with a long lasting trigger, a low energy (∼1 keV) miniature source version, and a broad beam (50 cm diam extractor) multicathode version. Progress has been made also in characterization and manipulation of the plasma prior to extraction, e.g., in the understanding of the ion charge states produced and the development of macroparticle-removing magnetic filters. Advances in vacuum arc ion source design and operation have been accompanied by a deeper understanding of plasma production in vacuum arc cathode spots, and several features of vacuum arc ion sources can be explained by the specifics of ion formation within the spots. Here we present a short overview of some fundamental vacuum arc processes and examine some of the recent developments in vacuum arc ion source design and application.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1145024
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