ISSN:
1013-9826
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
A feasibility test for real-time fine particle measurements in vacuum semiconductorprocessing equipment has been conducted. The approach in monitoring particles in processequipment is an installation of a sensor at a critical location inside the process equipment (hence theterm ‘in-situ’) to track free particle levels in real-time. Common method for particle detection in aprocess chamber today is a use of test wafer with a laser wafer scanner. However, this method doesnot give a real time information of the particle status in the process chamber. In this paper, a newmethod has been developed to detect particles in real time in vacuum system for particles smaller thanan optical method can detect. The system consists of a particle charging region and a particle detectionregion in a vacuum system. Particles with 50nm are successfully detected at about 10 torr region
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/01/52/transtech_doi~10.4028%252Fwww.scientific.net%252FKEM.321-323.1707.pdf
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