Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
53 (1988), S. 1955-1957
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Chemical etching of Si(111) surface by chlorine molecules under 355 and 560 nm irradiation has been studied using a continuous wave supersonic molecular beam. Only two products, SiCl and SiCl2, were observed. The translational energy distributions of the gaseous products have been measured as a function of laser fluence, and can be fitted with Maxwell–Boltzmann distributions. Study on the effect of translational energy of incident chlorine molecules on the reaction rate is also presented for the first time.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.100334
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