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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 527-529 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Edge-defined film-fed grown silicon wafers with a thin Au film deposited on one side were annealed at 950 °C for various times. Spreading resistance probe measurements showed that at the wafer free surface the Au concentration was higher than the Au solubility in silicon found at the Au source side. Scanning electron microscopy, transmission electron microscopy, and energy-dispersive spectroscopy investigations revealed Au particles of nanometer size at the wafer free surface. The enhancement of the Au solubility at the wafer free surface is attributed to the existence of these small Au particles.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 196-203 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: An investigation of nickel diffusion in silicon wafers at 1200 °C, which is above a few Ni-Si eutectic and peritectic temperatures, has been performed. Czochralski Si wafers with nickel film on the back surfaces and mechanical damages on the front surfaces were annealed in different ambients for various periods of time. The wafers annealed in vacuum showed that a liquid phase rich in nickel has been formed at their front (initially free) surfaces at the annealing temperature. The amount of the liquid-phase material increases with an increase of the annealing time. After cooling down, the solidified materials showed various morphologies: spheres, polygons, dendrites, and terraces. The thermodynamic driving force leading to this phenomenon is attributed to the Si (free) surface energy.
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 7207-7216 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Experiments have been conducted to study the Si outdiffusion behavior in GaAs using predoped samples. The results showed that the Si diffusivity values are dependent on the As4 vapor-phase pressure in the ambient, and on the electron concentration in the crystal. It is concluded from these results that, in GaAs, diffusion of the Si donor species occupying Ga sites SiGa+ is governed by the triply negatively charged Ga vacancies, VGa3−. The present VGa3−-dominated SiGa+ outdiffusion diffusivity values are, however, larger than those obtained under Si indiffusion conditions by many orders of magnitude. A tentative explanation of this large difference is given in terms of an undersaturation of VGa3− in intrinsic GaAs during indiffusion experiments and of a supersaturation of VGa3− developed during the outdiffusion of Si from n-type, Si-doped GaAs.
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 5376-5384 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Expressions of the thermal equilibrium concentrations of Si in GaAs have been obtained in terms of fundamental constants of the involved materials. Silicon is an amphoteric dopant in GaAs, with four species: a neutral and an ionized shallow donor species occupying Ga sublattice sites, and a neutral and an ionized shallow acceptor species occupying As sublattice sites. The concentration of an ionized Si species is expressed by the concentration of the appropriate neutral species and the GaAs crystal Fermi level or the carrier concentration and the band gap energy level positions. The thermal equilibrium concentrations of the two neutral species are expressed by the relevant Gibbs free energies of formation and the As4 vapor phase pressure in the ambient. Using these equations, the long observed relations between the carrier and Si concentrations in different experiments involving both n- and p-type Si doping produced GaAs are quantitatively explained. A difference of ∼1.55 eV in the effective formation enthalpy between the neutral Si atoms occupying the As and Ga sublattice sites has been identified. Moreover, at high temperatures, the GaAs intrinsic Fermi level energy Ei appears to be higher than the midgap energy Eg/2 by ∼20–80 meV. © 1999 American Institute of Physics.
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 3858-3863 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Gettering is already an integral part of fabricating integrated circuits using Si substrates. It is anticipated that this will also be true for solar cell fabrication in the near future. A readily available technique compatible with solar cell processing is gettering by the Si wafer back surface Al. Recently, available solar cell efficiency studies have shown the beneficial effects of the wafer backside Al, including that of gettering, a wafer backside field, and grain boundary and dislocation passivation. In this article, we report on experimental results which showed that Czochralski Si wafer bulk minority carrier diffusion lengths can be substantially improved by wafer backside Al treatment, which also provided an effect of protection from environmental contamination. In these experiments, only the effect of gettering is present and therefore the results constitute an unambiguous demonstration of the benefits of gettering by Al. © 1995 American Institute of Physics.
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  • 6
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The retardation phenomenon of oxygen precipitation in Czochralski silicon has been studied simultaneously with the growth of surface stacking faults under a silicon nitride capping layer. The surface faults were intentionally introduced to monitor the bulk self-interstitial supersaturation in the crystal during precipitate growth. It was observed that an increase in the low-temperature nucleation anneal time resulted in a reduced rate of oxygen precipitation and an enhanced rate of surface stacking fault growth at high temperatures. This indicates that as the nucleation anneal time increases, silicon self-interstitials, which must be generated for precipitation to proceed, reach a high level of supersaturation and cause the annihilation of most nuclei generated during the nucleation anneal.
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  • 7
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 67 (1995), S. 2863-2865 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A quantitative determination of the contribution of As self-interstitials to the As self-diffusion coefficient in GaAs has been carried out. Values of the As self-interstitial contributions are deduced from sulfur indiffusion profiles in GaAs, which are simulated based on the kick-out mechanism. Furthermore, the relative contributions of As self-interstitials and of As vacancies are discussed. © 1995 American Institute of Physics.
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 66 (1989), S. 2952-2961 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We propose a quantitative model for Si diffusion in GaAs. In this model we incorporate the experimental result that Si is an amphoteric impurity which constitutes a shallow donor when occupying the Ga site, Si+Ga, and a shallow acceptor when occupying the As site, Si−As. At high concentrations Si+Ga and Si−As coexist. The amphoteric behavior of Si may be viewed as an effect of the Fermi level. We assume that Si+Ga and Si−As diffuse respectively on the Ga and As sublattices. That is, the diffusion of Si+Ga and Si−As is governed by the variously charged Ga vacancies and As vacancies (or self-interstitials), respectively. The experimentally observed Si diffusivity is concentration dependent which results from the Si amphoteric nature as well as from another effect of the Fermi level, which is its influence on the concentrations of the charged point-defect species. Satisfactory quantitative descriptions of available experimental results are obtained. An analysis of the data on Si diffusion into a Sn-doped GaAs substrate has led us to believe that the previously proposed Si-pair diffusion model may no longer be favored.
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 2461-2470 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: In GaAs and AlAs/GaAs superlattice crystals containing n-type regions, several sets of recent experimental results obtained from diffusion studies require the interpretation that the responsible point defect species, the triply negatively charged Ga vacancy (VGa3−), has attained its thermal equilibrium concentration (CVGa3−eq) at the onset of an experiment. This could be due to either the fact that under heavy n-doping conditionsCVGa3−eq is fairly temperature independent, or the fact that the transient process of populating VGa3− from an undersaturated to the appropriate CVGa3−eq value via indiffusion from the surfaces to the interior of the crystals is extremely rapid. We have simulated the transient process of populating VGa3− to the crystal interior. The experiments use crystals consisting of adjacent intrinsic and n-type regions for which CVGa3−eq values are different, leading to the simultaneous occurrence of VGa3− diffusion and segregation phenomena. A diffusion-segregation equation has been derived and subsequently used in the simulation calculations. The simulation results showed that, as long as n-type regions are involved, such transient processes are ineffective and therefore cannot explain the experimental requirement that VGa3− is already present in the appropriate CVGa3−eq(n) value at the onset of an experiment. On the other hand, the transient process is sufficiently rapid for the purely intrinsic crystal cases. These simulation results support our recent finding that the CVGa3−eq(n)values are essentially temperature independent, obtained via a thermodynamic treatment.
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  • 10
    Publication Date: 2003-08-11
    Print ISSN: 0003-6951
    Electronic ISSN: 1077-3118
    Topics: Physics
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