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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 2290-2295 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Electrodeposited films of cuprous oxide show high resistivities in the range of 109–1012 Ω cm. The p-type conductivity, its temperature dependence, and its thermostimulated characteristics can be explained by assuming that a pair of deep levels (acceptor and donor type) control the electrical properties of these films. A novel thermostimulated conductivity model is introduced to include the effect of impurity conduction. Impurity conduction through the acceptor-type level is the dominant transport mechanism at temperatures below approximately 200 K. The experimental results on thermostimulated conductivity measurements reveal the effect of Poole–Frenkel lowering of the ionization energy of the acceptor-type deep level. For a typical sample the zero-field ionization energy of this level is 0.792 eV. Having a concentration of 5×1013 cm−3 and a hole capture cross section of 3.12×10−9 cm2, this level is compensated with a donor-type level of unknown ionization energy having a concentration of 1.89×1013 cm−3. Impurity conduction in this sample shows an activation energy of 0.03 eV before and 0.08 eV after a sample is illuminated at 77 K. From the measurement of the Poole–Frenkel constant the electron affinity of the film is obtained to be 2.9 eV.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 2365-2369 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Space-charge-limited-current conduction is the dominant charge transport mechanism in electrodeposited films of cuprous oxide; the measurement of current-voltage characteristic and temperature dependence of conductivity, while charge transport is space-charge limited, is used to evaluate the electrical parameters of the films. From these measurements and the measurement of the material band gap and dielectric constant, the energy-band diagram of Cu2O films has been determined for the first time. An optoelectronic band gap of 2.0 eV and a dielectric constant of 8.8 is measured for these films. The hole mobility in a sample with a resistivity of 1.1×1011 Ω cm is measured to be 8.7 cm2/V s. The conductivity of this sample is controlled by an acceptor-type deep level (0.54 eV above valence band) with a concentration of 6.65×1014 cm−3 which is compensated with a donor-type level (0.92 eV below conduction band) having a concentration of 6.64×1014 cm−3.
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 90 (2001), S. 4265-4271 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Solar cells of p-CdTe/n-CdS structure with a conversion efficiency of 10%±1% (AM1 spectrum, 127 mW/cm2 irradiance) were prepared by electrodeposition of CdTe on CdS-coated conducting glass. CdS was coated by chemical bath deposition. The tin–oxide conducting glass was prepared by the spray pyrolysis technique. The current–voltage, capacitance–voltage, photocurrent–voltage, photocurrent spectroscopy, and photoinduced current transient spectroscopy measurements proved to be powerful tools for the characterization of junction. The concentration of donors and acceptors in both sides of the junction are comparable, in the range of 1016 cm−3. The cell built-in potential is 1.20 V from which 0.65 V drops across the depletion width of CdTe. From the analysis of experimental data to construct the energy band diagram, it becomes evident that an electric dipole layer must exist at the CdTe/CdS interface. The presence of this layer is associated with a discontinuity of electrostatic potential at the interface by 0.28 V and a conduction-band spike of 64 meV. The conduction-band spike and an interfacial recombination center are accountable for the collection losses of photogenerated carriers. The recombination center that is likely related to the interstitial cadmium defect is energetically located 0.63 eV below the conduction-band edge and has a capture cross section of 8.8×10−12 cm2. © 2001 American Institute of Physics.
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 83 (1998), S. 1049-1057 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Thin films of fluorine-doped SnO2 have been prepared by deposition on borosilicate glass using the spray-pyrolysis technique. The effect of doping on the concentration and mobility of the charge carriers (electrons) as well as the resistivity of the films has been studied. The undoped films had a resistivity of a few m Ω cm; this could be reduced by a factor of 10 by doping. The electron mobility in undoped films was about 3 cm2/Vs but could be improved by a factor of 5 to 6 by doping. The doping yield was about 2.3%. The high quality films which were deposited for photovoltaic applications had a sheet resistance of R(square, open)=2 Ω/sq and an average transmittance, in the visible region, of T=85% for a thickness of 1.1 μm. Their figure of merit is one of the highest values reported: φ=T10/R(square, open)(approximate)0.1 S. The optical dispersion of our films can be explained perfectly by classical models. In the wavelength region of λ〈0.580 μm, the refractive index, N, for undoped and doped films can be given by N=[1+λ2/(0.370λ2−0.0105)]1/2, where λ is in μm. From the study of dispersion and the plasma resonance frequency, the numerical values at optical frequencies of the dielectric constant, electron mobility, and electron effective mass were determined as 3.70, 9.3–11.8 cm2/Vs, and (0.26–0.45)m0, respectively, where m0 is the mass of free electrons. From the variation of direct and indirect optical transition energies with the carrier concentration, the density-of-states effective masses for electrons and holes were obtained as 0.85 m0 and 0.78 m0, respectively. These studies revealed a direct energy bandgap of 4.11 eV for SnO2 in addition to a defect band situated 0.45 eV above the valence band edge. © 1998 American Institute of Physics.
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 62 (1987), S. 1528-1529 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: By using an optical reflectance interferometry method the refractive index n of electrodeposited films of Cu2O was measured in the wavelength region of λ=0.466–1.2 μm. This measurement was an extension to the previously reported values. The result fits well to an empirical dispersion equation of the form n2=1+4.81λ2/(λ2−0.125), where λ is in μm. The dispersion values measured for electrodeposited films were found to be different from the reported values for other types of Cu2O.
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 81 (1997), S. 7988-7993 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: For the measurement of optical constants, the electrodeposited films of CdTe were lifted off their opaque substrates and transferred onto glass slides using a transparent liquid adhesive. This technique proved to give results more reliable than those obtained on samples in which CdTe is deposited on CdS-coated conducting glass. The measured optical dispersion in the photon energy range of E〈1.5 eV is in excellent agreement with that for the single crystal. The optical absorption coefficient was determined in the E〈3.5 eV range and was compared with that for the single crystal. The results revealed two direct allowed transitions at 1.50 eV [Γ8 valence band(VB)→Γ6 conduction band(CB)] and 2.43 eV [Γ7(VB)→Γ6(CB)] and three indirect allowed transitions at 1.27 eV [L4,5(VB)→Γd], 1.83 eV [L6(VB)→Γd], and 2.84 eV [Γ8(VB)→L6(CB)]. The 1.27 and the 1.83 eV transitions, which have not been reported previously and were not detected in single-crystal data, are attributed to the transitions to a grain-boundary-related defect energy band Γd, 0.65 eV above Γ8 (VB). The indirect transitions at 1.83 and 2.84 eV are assisted by phonons having energies of 80 and 84 meV, respectively. © 1997 American Institute of Physics.
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  • 7
    Electronic Resource
    Electronic Resource
    Springer
    Journal of materials science 8 (1997), S. 207-211 
    ISSN: 1573-482X
    Source: Springer Online Journal Archives 1860-2000
    Topics: Electrical Engineering, Measurement and Control Technology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Abstract Thin films of cuprous oxide (4.6 μm) were electrodeposited on molybdenum. Gold contacts were vacuum evaporated on the films to form devices. These films showed relatively low electrical resistivities at around 106 Ω cm and a charge transport mechanism which is different from the space charge limited current conduction previously reported for the 1011 Ω cm films. The charge transport mechanism in these films was determined by isothermal measurements of the devices current-voltage (I–V) characteristics at some selected temperatures in the range of 78–321 K. In this temperature range the dominant transport mechanism can be explained by the Poole-Frenkel effect through the relation I = VG0exp(−φ0L/kT)exp(BLV1/2)+I0exp(−φ0H/kT)exp(BHV1/2) where the numerical values of the parameters are measured. φ0L = 0.12 eV is the zero-field ionization energy of a shallow acceptor-type level (measured from the edge of the valence band) which has the dominant effect in the range of 78–230 K. Similarly φ0H = 0.70 eV corresponds to a deep level dominant in the high-temperature range 230–321 K. In the high-temperature region a 2.7 μm thick hole accumulation layer forms beneath the oxide-gold interface, assuming the ionized deep level is doubly charged.
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  • 8
    Electronic Resource
    Electronic Resource
    Springer
    Journal of materials science 23 (1988), S. 3847-3853 
    ISSN: 1573-4803
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Abstract The polycrystalline films of Cu2O, prepared by electrodeposition, consist of grains with well-defined geometrical shapes. The size and the orientation of grains which define the surface texture can be controlled by controlling the deposition parameters. Grains with a size ranging from a few tenths of a micrometer to about 10μm and with a preferential orientation of the (1 0 0) or (1 1 1) planes parallel to substrates can be obtained under certain deposition conditions. The effect of pH, bath temperature and the rate of deposition on the orientation and the size of grains is discussed.
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  • 9
    Publication Date: 2013-05-15
    Print ISSN: 0022-2461
    Electronic ISSN: 1573-4803
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Published by Springer
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  • 10
    Publication Date: 1988-11-01
    Print ISSN: 0022-2461
    Electronic ISSN: 1573-4803
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Published by Springer
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