Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
63 (1988), S. 2783-2786
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The activation of magnesium implants in GaAs has been found to increase drastically with coimplantation of arsenic and to depend strongly on the As implantation parameters. p-type carrier concentrations as high as 4×1020 cm−3 have been achieved for 5×1015 cm−2, 190-keV Mg+/1×1016 cm−2, 540-keV As2+ implants. The role of the As has been shown to block the Mg diffusion during the silicon-nitride-capped 5-min anneals at 750 °C.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.341173
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